248nm Products

All 248nm ARC products are PFOS Free, for your health and the safety of the environment.

 

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DUV112S is the latest product in Brewer Science’s BARC product family line. This product is specifically designed for certain devices that require a very low defect BARC. DUV112S has demonstrated to have extremely high resolution, broad resist compatibility, high etch rate, excellent shelf life in normal storage conditions and easy to process.

DUV252 is specifically designed to be compatible with ESCAP DUV photoresists and for use in the dual damascene process. Their planarizing characteristics ensure better control of resist thickness over steps to minimize reflective notching and improve CD control.

DUV42S is compatible with ESCAP photoresists. DUV42S utilizes a conformal design and an increased etch rate while optimizing step coverage. DUV42S is optimized to meet the requirements of the <0.10µm design rule.

DUV64 is a member of the latest generation of anti-reflective coatings. DUV64 demonstrates superior optical and coat qualities which allow it to be coated considerably thinner than previous series. The advanced capability of this BARC enables faster throughput time, with a demonstrated etch rate of over two times faster than traditional BARCs.

DUV54 was designed for use in dual damascene processes and is compatible with Acetal DUV photoresists. Its planarizing characteristics ensure the ability to acheive better control of resist thickness over steps to minimize reflective notching and improve CD control.

DUV44 is designed for < 0.18 µm design rules. DUV44 demonstrates excellent profiles with a broad range of Acetal photoresists. This product provides a planar, fast etching BARC layer.

Would you like more information about 248nm ARC® products? Click here to fill out an inquiry form or call 573.364.0300 (US) to talk directly to a technical representative.