365-nm (i-Line) Products

The Brewer Science 365-nm product line of anti-reflective coatings aids the manufacturer in extending the usability of capital equipment by reducing critical dimension.

Brewer Science ARC i-CON® Coating

ARC® i-CON coating is a highly conformal product designed to address issues of coverage and over-etch. It offers a 30% faster etch rate than most advanced i-line photoresists. This series delivers exceptional optical properties through the control of substrate reflectivity which improves CD resolution. At 0.35µm features, the series gives excellent profiles, and has demonstrated feature sizes of 0.25µm with PFI-88.

Brewer Science XHRiC Coating

The XHRiC coating is a highly robust product line specifically designed for advanced i-line dry patterning processes. This optical design with an n-value of 1.84 and a k-value of 0.34 gives excellent absorbance. These products have been employed in poly, gate and metalization levels for 0.30-0.35µm design rule devices. With continuous improvements in lithography technologies 0.25µm feature sizes have been resolved.

Brewer Science WiDE®-B Coating

The WiDE®-B coating is specifically designed for wet patterning, which eliminates the need for a substrate adhesion promoter and separate BARC etch. The extended bake latitude and advanced optical characteristics allow the wet-patterning process to achieve 0.35-0.40µm patterns. WiDE®-B is especially useful as a platform for a separation layer that serves as a lift-off application in devices such as surface acoustic wave guides (SAWs).

Brewer Science WiDE® -30W Coating

Brewer Science WiDE® 30W anti-reflective coating is wet developable and therefore eliminates the need for a BARC etch step.  All WiDE® anti-reflective coatings minimize CD variation by eliminating standing waves and reflective notching. This material can also be used for dry-etch systems with excellent results. WiDE® 30W anti-reflective coating has been successfully used as a sacrificial layer for lift-off applications.

  • Compatible with leading i-line resists
  • High absorbance allows less than 0.01-µm CD variations over 1800 Å of topography
  • Useful as a sacrificial layer in lift-off applications
  • Wet developable – no impact on etch tool or cycle time
  • PFOS free, for your health and the safety of the environment.

Optical Properties of the 365-nm ARC® Product Line

Product

n

k

Cauchy A

Cauchy B

Cauchy C

ARC i-CON® Coating

1.84

0.37

1.587

1.3E-02

1.8E-03

WiDE® B Coating

1.72

0.33

1.6324

4.423E-2

-6.8E-3

WiDE® B Coating

1.72

.033

1.632

4.423E-2

-6.8E-3

XHRiC Coating

1.81

0.34

1.618

9.08E-3

2.9E-3

Photoresist Compatibilities of the 365-nm ARC® Product Line

Brewer Science 365-nm ARC® products are compatible with all commercialized photoresists used in manufacturing.

Contact Brewer Science

For more information, fill out an inquiry form or call 573.364.0300 (US) to talk directly with a technical representative. Brewer Science welcomes the opportunity to provide quality solutions for your specific applications.

All ARC® products are PFOS Free, for your health and the safety of the environment.