THE LITHOGRAPHY SYMPOSIUM - Europe 2008


 

Please join Brewer Science at either The Lithography Symposium events

Milan, Italy - 1 April, 2008

Dresden, Germany - 3 April, 2008

Brewer Science is pleased to announce the location of the spring symposia series. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discuss technical challenges and collaborative solutions related to photolithography and semiconductor manufacturing processes.

 

Two opportunities to attend

THE LITHOGRAPHY SYMPOSIUM - Milan, Italy
1 April, 2008

Event location

Cosmo Hotel Torri
Via Torri Bianche, 420059
Vimercate Milan
Italy
Phone: +39.039.69961


THE LITHOGRAPHY SYMPOSIUM - Dresden, Germany
3 April, 2008

Event location

Westin Bellevue Hotel
Grosse Meissner Str. 15
01097 Dresden
Germany
Phone: +49.351.8050

 

Symposium Agenda


Milan - 1 April


12:00  Registration opens

12:30  Lunch

13:30  Welcome - Brewer Science, Inc. - Lori S. Nye, Executive Director, Marketing

13:45  Thermal analysis techniques applied to microlithography, Samir Derrough - Cea-Leti

14:15  Challenges in finding Bottom Anti-Reflective Coatings for Immersion lithography, Inge Vermeir - Qimonda

14:45  BARC for Immersion and Hyper NA process, Shigeo Kimura - Nissan Chemical Ind.

15:15 ArF BARC & Resists influence on elliptical contact shape when using dipole illumination, - Enrico Tenaglia - ST Agrate

15:45  Coffee Break

16:15  Anti-reflective coatings for multi-patterning lithography,

Douglas Guerrero - Brewer Science, Inc.

16:45  Update on IMEC EUV lithography, - Ivan Pollentier - IMEC

17:15  Immersion Defectivity Process Development, Suping Wang - ASML

17:45  Closing  & Speaker’s Corner

19:00  Dinner

Please continue the conversation over dinner that follows the symposium for all attendees provided by Brewer Science.


Dresden - 3 April


12:00  Registration opens

12:30  Lunch

13:30  Welcome - Brewer Science, Inc. - Lori S. Nye, Executive Director, Marketing

13:45  1900i BARC screening - Daphne Keller - ASML

14:15  Update on IMEC EUV lithography, Ivan Pollentier - IMEC

14:45  BARC for Immersion and Hyper NA process, Shigeo Kimura - Nissan Chemical Ind.

15:15 ArF BARC & Resists influence on elliptical contact shape when using dipole illumination, Enrico Tenaglia - ST Agrate

15:45  Coffee Break

16:15  Anti-reflective coatings for multi-patterning lithography,

Douglas Guerrero - Brewer Science, Inc.

16:45  Challenges in finding Bottom Anti-Reflective Coatings for Immersion lithography, Inge Vermeir - Qimonda

17:15  Resist poisoning as a limiting factor in BEOL process integration, Thomas Werner - AMD

17:45  Closing  & Speaker’s Corner

19:00  Dinner

Please continue the conversation over dinner that follows the symposium for all attendees provided by Brewer Science.

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Registration


Please click here for the registration form.


Your registration acceptance will be confirmed by a returned email message.

There is no charge for any of the symposium events.

 

Cancellations


Please contact THE SYMPOSIUM TEAM if you find that you can not make it to the symposium by clicking here.

 

Presentation Guidelines

 

There are no style guidelines or specifications for submitting your abstract. However, please provide the following information:  title of presentation, a minimum of one paragraph, author name(s) (with the presenter’s name in boldface type), organizational affiliation(s), your contact information, AND your biography so that we can introduce you.

Please e-mail your Microsoft® Word abstract to: arc_info@brewerscience.com

The actual presentation can be submitted in either Microsoft® PowerPoint® or Adobe Acrobat® format. See due dates below. The published presentations will all be converted to a pdf file before distribution.

If you have questions, please contact Anne Lindgren at +1.573.364.0444 ext. 1164 or e-mail arc_info@brewerscience.com

Due dates:
Title of presentation, abstract and a one paragraph biography due: August 17, 2007
Finished presentation (pdf or ppt) sent to alindgren@brewerscience.com:  October 1, 2007

* Submission of an abstract or finished presentation will be considered your acceptance of the terms for Brewer Science to publish your abstract, biography and presentation.

Also speakers, please register at this link: Symposium Registration form.

PRESENTATION - TRANSFER OF COPYRIGHT to Brewer Science, Inc.


Permission for including your presentation in the Symposium CD and on the Brewer Science web site:

By submitting an abstract and presentation, the author(s) hereby assigns to Brewer Science, Inc., copyright ownership in the submitted presentation, effective when the presentation is accepted for publication by Brewer Science. This assignment gives Brewer Science the right to register copyright to the presentation in its name and to publish the presentation in any print or electronic medium.

Authors, or their employers in the case of works made for hire, retain the right to prepare derivative publications based on the presentation provided that publication of a derivative work occurs subsequent to the official publication date of the Brewer Science publication in which the presentation appears.

By submitting an accepted presentation, the authors warrant that (1) this work does not infringe on any copyright or other rights in any other work; (2) all necessary reproduction permissions or licenses have been obtained; and (3) the authors or employer own the copyright in the presentation, are authorized to transfer it, and have full power to enter into this Agreement with Brewer Science.

This presentation, together with other presentations, will be covered by a copyright notice in the name of Brewer Science, Inc.

Brewer Science, Inc.

THE LITHOGRAPHY SYMPOSIUM Committee
2401 Brewer Dr.
Rolla, MO 65401
e. email form
t. +573.364.0300 (USA)


 

 

 

 
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