THE LITHOGRAPHY SYMPOSIUM - Europe 2008
Please join Brewer Science at either The Lithography Symposium events Milan, Italy - 1 April, 2008 Dresden, Germany - 3 April, 2008 Brewer Science is pleased to announce the location of the spring symposia series. The goal of this symposium is to provide an opportunity for the semiconductor manufacturing community to discuss technical challenges and collaborative solutions related to photolithography and semiconductor manufacturing processes.
Two opportunities to attend
THE LITHOGRAPHY SYMPOSIUM - Milan, Italy Cosmo Hotel Torri
Event location Westin Bellevue Hotel
Symposium Agenda
12:00 Registration opens 12:30 Lunch 13:30 Welcome - Brewer Science, Inc. - Lori S. Nye, Executive Director, Marketing 13:45 Thermal analysis techniques applied to microlithography, Samir Derrough - Cea-Leti 14:15 Challenges in finding Bottom Anti-Reflective Coatings for Immersion lithography, Inge Vermeir - Qimonda 14:45 BARC for Immersion and Hyper NA process, Shigeo Kimura - Nissan Chemical Ind. 15:15 ArF BARC & Resists influence on elliptical contact shape when using dipole illumination, - Enrico Tenaglia - ST Agrate 15:45 Coffee Break 16:15 Anti-reflective coatings for multi-patterning lithography, Douglas Guerrero - Brewer Science, Inc. 16:45 Update on IMEC EUV lithography, - Ivan Pollentier - IMEC 17:15 Immersion Defectivity Process Development, Suping Wang - ASML 17:45 Closing & Speaker’s Corner 19:00 Dinner Please continue the conversation over dinner that follows the symposium for all attendees provided by Brewer Science.
12:00 Registration opens 12:30 Lunch 13:30 Welcome - Brewer Science, Inc. - Lori S. Nye, Executive Director, Marketing 13:45 1900i BARC screening - Daphne Keller - ASML 14:15 Update on IMEC EUV lithography, Ivan Pollentier - IMEC 14:45 BARC for Immersion and Hyper NA process, Shigeo Kimura - Nissan Chemical Ind. 15:15 ArF BARC & Resists influence on elliptical contact shape when using dipole illumination, Enrico Tenaglia - ST Agrate 15:45 Coffee Break 16:15 Anti-reflective coatings for multi-patterning lithography, Douglas Guerrero - Brewer Science, Inc. 16:45 Challenges in finding Bottom Anti-Reflective Coatings for Immersion lithography, Inge Vermeir - Qimonda 17:15 Resist poisoning as a limiting factor in BEOL process integration, Thomas Werner - AMD 17:45 Closing & Speaker’s Corner 19:00 Dinner Please continue the conversation over dinner that follows the symposium for all attendees provided by Brewer Science.
Registration
There is no charge for any of the symposium events.
Cancellations
Presentation Guidelines
There are no style guidelines or specifications for submitting your abstract. However, please provide the following information: title of presentation, a minimum of one paragraph, author name(s) (with the presenter’s name in boldface type), organizational affiliation(s), your contact information, AND your biography so that we can introduce you. PRESENTATION - TRANSFER OF COPYRIGHT to Brewer Science, Inc.
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