Featuring thermal accuracy and precision normally found only on expensive track systems, the Cee® 1300 provides these qualities in a portable and convenient benchtop unit. With its convenient and user-friendly design, Cee® 1300 programs are easily entered, monitored, and stored through a newly enhanced graphical user interface. Small footprint, intuitive design, and unequalled experience add up to years of high-performance bake step processing, perfect for any low-volume or R&D laboratory processing environment.
Programmability
- Alpha Numeric Capable GUI (Graphical User Interface)
- User Friendly Touch Screen Interface and Display
- 700 Bake Process Programs
- Bake Steps: 3 steps/program
- 0.1 Second Resolution for Step Times (Time: 0-999.9sec/step)
- Three automated bake methods (contact, vacuum, & proximity)
- Bake Plate Auto Sizing for 3", 100, 125, 150, 200mm
- Temperature Data Recording Standard
- Programmable Logic Controller (PLC) system controller
- PC Compatible: Ethernet Port for Communications for Uploading/Downloading Process Parameters Standard
- Security: (Password Protection Option/ No Charge)
- Ramping Capability Optional (8 specific set points)
Precision
- Substrate Sizes (<1cm – 200mm Round/ 6" X 6" Square)
- Temperature Resolution: 0.1° C
- Temperature Range: Ambient-300° C (400° C Optional)
- Temperature Uniformity: 0.3% Across Working Surface
Reliability
- Exceptional Reliability and Up-Time
- 1 Year Full Warranty Parts and Labor
- Free Technical Phone Support for the Life of the Product
- Application Process Assistance for Life of the Product
Exhaust Bake Hood Design
- All Stainless Steel Construction
- Exhausted Hood for Removal of Process Chemicals
- Optional Nitrogen Purge for Inert Bake Environment
Dimensions
- Machine weight: 70 lbs.
- Shipping weight: 210 lbs.
- Cabinet dimensions: 24"L x 13"D x 13"H
Utilities
- Voltage ranges: 100, 110-125, 208-240 VAC, 50/60 Hz
- Power requirements: 1057, 1683, 1555 watts
- Exhaust port: 1" OD
- Vacuum: 25" Hg
- Exhaust: 50 cfm at 0.2" water
- Nitrogen (for bake plate proximity): 35 psi