Cee® 200CBX Precision Coat-Bake System

Cee® 200CBXPrecision Coat-Bake System

The Brewer Science® Cee® 200CBX precision coat-bake system combines a track quality precision spin coater with a high uniformity bake plate, in an efficient space saving design.

Benefits

  • Onboard Windows®-based PC control for enhanced interface capabilities and connectivity
  • New compact design for minimized footprint
  • Full-color, 7-inch touch screen display
  • Teflon® spin bowl for maximum chemical compatibility
  • Simultaneous operation and monitoring for both the coat and bake modules

Download the Cee® Spin Chuck brochure

Specifications

Dimensions

  • 28" W x 19" D x 12" H (71.1 cm W x 48.3 cm D x 30.5 cm D)
  • Machine Weight: 165 lb (74.8 kg)
  • Shipping Weight: 250 lb (113.4 kg)

Programmability

  • Controlled by onboard Windows®-based PC
  • Touch screen interface and display
  • Ethernet port for network connectivity and uploading/downloading process parameters
  • 250,000 process programs onboard
  • Virtually unlimited steps per program
  • 0.1-s resolution for step times with a range of
  • 0 to 9,999.9 s/step
  • Energy-saving capability (for predetermined temperature output control)
  • Security: password protection available at no charge
  • Three automated bake methods: contact, vacuum, proximity
  • Bake plate auto sizing for 3-inch, 100-, 125-, 150-, and 200-mm substrates
  • Temperature data recording
  • Optional electronic lift pins (replace N2 proximity for loading/unloading substrates from bake module). Program 1000 specific proximity heights above the surface in any sequence or combination. Height is programmed in 0.001-inch increments with an overall range of 0.000 to 0.750 inches.
  • Ramping capability optional (8 specific set points within a single bake recipe)
  • Spin speed: 0 to 6,000 rpm (12,000 rpm option at no charge; 16,000 rpm option available)
  • Spin speed acceleration:
    0 to 30,000 rpm/s unloaded
    0 to 23,000 rpm/s for 200-mm substrate
    0 to 3,000 rpm/s for 6" x 6" x 0.25" photomask recessed chuck
  • System capable of controlling third-party host software for high-end IDI/Cybor/Mykrolis positive displacement pumps
  • Simultaneous dual automated dispense capability
  • Bidirectional speed control/oscillating chuck
  • Iteration software (recipe looping)
  • Dispense or component outputs: 50
  • In-process/dynamic speed/acceleration control

Precision

  • Spin speed repeatability: within < 0.2 rpm
  • Spin speed resolution: within < 0.2 rpm
  • Substrate sizes: < 1 cm to 200 mm round; 7" x 7" square)
  • Temperature resolution: ± 0.1°C
  • Temperature range: ambient to 300°C (400°C optional)
  • Temperature uniformity: 0.3% across working surface

Reliability

  • Indirect drive system protects the spin motor from contact with process chemicals and solvents
  • Vacuum and lid interlock
  • Exceptional reliability and uptime
  • 1-year full warranty on parts and labor
  • Free remote technical support (phone, email, fax) for the life of the product
  • Application process assistance for life of the product
  • Bowl & Exhaust Hood Design
  • All stainless steel construction
  • Teflon® spin bowl for material compatibility
  • Integrated bowl ring to eliminate material migration
  • Optional stainless steel bowl (for all-stainless-steel construction)
  • Optional polyethylene bowl (educational package) available
  • Optional polyethylene liners available
  • Optional polyethylene/Teflon® splash ring
  • Closed and optional open lid designs for process flexibility
  • Drain and exhaust ports located in the bottom of bowl
  • Exhausted hood for removal of process chemicals
  • Optional nitrogen purge for inert spin/bake environment

Utilities

  • Voltage ranges: 100, 110-125, 208-240 VAC, 50/60 Hz
  • Power requirements: 1793 watts (16 amps)
  • Drain Port: 0.75 inch OD
  • Exhaust Port: 1" OD
  • Vacuum: 20 to 25 inches Hg
  • Bowl Exhaust: 20 to 50 cfm
  • Bake Plate Exhaust: 1" OD; 5 to 10 cfm
  • Nitrogen or CDA (for automated dispenses): 70 psi

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