Brewer Science offers both spray and puddle dispense options on the Cee^® 200D developer. These dispense methods are normally used in conjunction with a pressure can dispense which holds the developer.

The spray developer option utilizes two spray nozzles to apply developer solution and deionized (DI) water. The spray developer option uses an open UHMW lid with spray nozzles mounted outside the wafer plane, spraying inward from the center of the wafer out.

• This unit uses 1-gallon pressure cans as the reservoirs for the solutions.
• A maximum of four spray nozzles can be used to apply developer solution and DI water
• This option can be configured to accommodate up to four center-puddle dispenses
• DI Water Rinse: Brewer Science offers both topside and backside DI water rinse options. This dispense method is normally used in conjunction with a pressure can dispense or by using a house DI water supply.
• 200DB Option: Available with integrated hot plate for post-exposure bake (PEB applications).

Programmability

• Alphanumeric-capable graphical user interface (GUI)
• User-friendly touch screen interface and display
• 700 process programs
• 20 steps per program (upgradable with software option)
• 0.1-second resolution for step times
• Spin speed: 0 to 6,000 rpm (12,000 rpm option at no charge)
• Spin speed acceleration, heavy duty spin motor (200 watts continuous/800 watts peak)
  • 0 to 30,000 rpm/sec unloaded
  • 0 to 23,000 rpm/sec for a 200 mm substrate
  • 0 to 3,000 rpm/sec for a 6" x 6" x .250" photomask recessed chuck
• PLC controlled
• PC compatible: Ethernet port for uploading/downloading process parameters standard
• Simultaneous dual automated dispense capability
• Security: Password protection option at no charge

Precision

• Spin speed repeatability: < 0.2 rpm
• Spin speed resolution: < 0.2 rpm
• Substrate sizes (< 1 cm to 200 mm round / 6" x 6” square)

Reliability

• Indirect drive system protects the spin motor from accidental contact with process chemicals and solvents
• Vacuum and lid interlock standard
• Industry-leading reliability and up-time
• 1-year full warranty for parts and labor
• Free technical phone support for the life of the product
• Application process assistance for life of the product

Bowl Design

• All stainless steel construction
• ETFE-coated spin bowl option for material compatibility
• Optional polyethylene liners available
• Optional polyethylene/Teflon® splash ring closed and optional open lid designs for process flexibility
• Drain and exhaust ports located in the bottom of the bowl
• Optional nitrogen purge for an inert spin environment

Dimensions

• Machine weight: 40 lbs.
• Shipping weight: 106 lbs.
• Cabinet dimensions: 24"L x 13"D x 13"H

Benchtop Coater and Coat-Bake System Available

The Brewer Science Cee^® 200D Spray and Puddle Developer is available as a or as a combination coat-bake system 200CB Coat-Bake System.