Cee® 200X Precision spin coater
With an easy to use interface and the utmost in chemical compatibility, all in an efficient, space-saving design, the Brewer Science® Cee® 200X is the optimal spin coater for research, university, MEMs, and lab use. Fully programmable and user-friendly, the Cee® 200X features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. With its convenient compact footprint, chemical compatibility, and durability, this easy-to-use benchtop system will provide years of high-performance spin coating, making the Cee® 200X purchase a smart and cost-effective decision for applying coatings to substrates up to 200 mm round or 7" square.
Benefits
- Full-color, 7-inch touch screen display with PC control for enhanced ease-of-use and connectivity
- Teflon®/polyethylene spin bowl for maximum process chemical compatibility
- Durable, deck-mountable wet-bench design with a minimized footprint saves benchtop space
Programmability
- PC-controlled
- Touch screen interface and display
- Full-color alphanumeric-capable graphical user interface
- 250,000 process recipe programs on board
- A virtually unlimited number of user-defined recipe program steps
- 0.1-second resolution for step times (9,999.9 seconds maximum step time)
- Spin speed: 0 to 6,000 rpm (12,000 rpm option at no charge; 16,000 rpm option available)
- Spin speed acceleration:
- 0 to 30,000 rpm/s unloaded
- 0 to 23,000 rpm/s 200-mm substrate
- 0 to 3,000 rpm/s 6" x 6" x 0.250" photomask recessed chuck
- Connectivity: USB/ethernet port for communications for uploading/downloading coating process parameters with offline firmware standard (unlimited number of offline recipes and recipe steps)
- System capable of controlling third-party host software for high-end IDI/Cybor/Mykrolis positive displacement pumps
- Simultaneous dual automated dispense capability
- Bidirectional speed control/oscillating chuck
- Iteration software (recipe looping)
- Dispense or component outputs: 50
- Security: Password protection option available at no charge
- In-process/dynamic speed/acceleration control
Precision
- Spin speed repeatability: < 0.2 rpm
- Spin speed resolution: < 0.2 rpm
- Substrate sizes: < 1 cm to 200 mm round; 7"x7" square
Reliability
- Indirect drive system protects the spin motor from contact with process chemicals and solvents
- Vacuum and lid interlock
- Industry-leading reliability and uptime
- 1-year full warranty on parts and labor
- Free remote technical support (phone, email, fax) for the life of the product
- Application process assistance for life of the product
Bowl Design
- Teflon® spin bowl for expanded material compatibility
- Integrated bowl ring to eliminate material migration
- Optional stainless steel bowl (for all-stainless-steel construction)
- Optional polyethylene bowl (educational package) available
- Optional polyethylene liners available
- Optional polyethylene/Teflon® splash ring
- Closed and optional open lid designs for process flexibility
- Drain and exhaust ports located in the bottom of bowl
- Optional nitrogen purge for an inert spin environment
Dimensions
- 13.25" W x 19" D x 12" H (33.65cm W x 48.26cm D x 30.48cm H)
- Machine weight: 40 lb (18.14 kg)
- Shipping weight: 100 lb (45.36 kg)
Utilities
- Voltage ranges: 100, 110-125, 208-240 VAC, 50/60 Hz
- Power requirements: 655 Watts
- Drain port: 0.75" OD
- Exhaust port: 1" OD
- Vacuum: 20 to 25" Hg
- Exhaust: 20 to 50 cfm at 0.2" water
- Nitrogen or CDA (for automated dispense): 70 psi