Cee® 200X precision spin coater

Cee® 200X Precision spin coater

With an easy to use interface and the utmost in chemical compatibility, all in an efficient, space-saving design, the Brewer Science® Cee® 200X is the optimal spin coater for research, university, MEMs, and lab use. Fully programmable and user-friendly, the Cee® 200X features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. With its convenient compact footprint, chemical compatibility, and durability, this easy-to-use benchtop system will provide years of high-performance spin coating, making the Cee® 200X purchase a smart and cost-effective decision for applying coatings to substrates up to 200 mm round or 7" square.

Benefits

  • Full-color, 7-inch touch screen display with PC control for enhanced ease-of-use and connectivity
  • Teflon®/polyethylene spin bowl for maximum process chemical compatibility
  • Durable, deck-mountable wet-bench design with a minimized footprint saves benchtop space

Download the Cee® Spin Chuck brochure

Download the Cee® Spin Coater Accessories

Programmability

  • PC-controlled
  • Touch screen interface and display
  • Full-color alphanumeric-capable graphical user interface
  • 250,000 process recipe programs on board
  • A virtually unlimited number of user-defined recipe program steps
  • 0.1-second resolution for step times (9,999.9 seconds maximum step time)
  • Spin speed: 0 to 6,000 rpm (12,000 rpm option at no charge; 16,000 rpm option available)
  • Spin speed acceleration:
  • 0 to 30,000 rpm/s unloaded
  • 0 to 23,000 rpm/s 200-mm substrate
  • 0 to 3,000 rpm/s 6" x 6" x 0.250" photomask recessed chuck
  • Connectivity: USB/ethernet port for communications for uploading/downloading coating process parameters with offline firmware standard (unlimited number of offline recipes and recipe steps)
  • System capable of controlling third-party host software for high-end IDI/Cybor/Mykrolis positive displacement pumps
  • Simultaneous dual automated dispense capability
  • Bidirectional speed control/oscillating chuck
  • Iteration software (recipe looping)
  • Dispense or component outputs: 50
  • Security: Password protection option available at no charge
  • In-process/dynamic speed/acceleration control

Precision

  • Spin speed repeatability: < 0.2 rpm
  • Spin speed resolution: < 0.2 rpm
  • Substrate sizes: < 1 cm to 200 mm round; 7"x7" square

Reliability

  • Indirect drive system protects the spin motor from contact with process chemicals and solvents
  • Vacuum and lid interlock
  • Industry-leading reliability and uptime
  • 1-year full warranty on parts and labor
  • Free remote technical support (phone, email, fax) for the life of the product
  • Application process assistance for life of the product

Bowl Design

  • Teflon® spin bowl for expanded material compatibility
  • Integrated bowl ring to eliminate material migration
  • Optional stainless steel bowl (for all-stainless-steel construction)
  • Optional polyethylene bowl (educational package) available
  • Optional polyethylene liners available
  • Optional polyethylene/Teflon® splash ring
  • Closed and optional open lid designs for process flexibility
  • Drain and exhaust ports located in the bottom of bowl
  • Optional nitrogen purge for an inert spin environment

Dimensions

  • 13.25" W x 19" D x 12" H (33.65cm W x 48.26cm D x 30.48cm H)
  • Machine weight: 40 lb (18.14 kg)
  • Shipping weight: 100 lb (45.36 kg)

Utilities

  • Voltage ranges: 100, 110-125, 208-240 VAC, 50/60 Hz
  • Power requirements: 655 Watts
  • Drain port: 0.75" OD
  • Exhaust port: 1" OD
  • Vacuum: 20 to 25" Hg
  • Exhaust: 20 to 50 cfm at 0.2" water
  • Nitrogen or CDA (for automated dispense): 70 psi

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