Lithography | Frequently Asked Questions

FAQs from our Lithography Team

Q. What are the benefits of using a bottom anti-reflective coating (BARC)?
A. Brewer Science^® ARC^®products are sacrificial spin-on coatings that provide reflectivity control during photoresist exposure, resulting in reduced critical dimension (CD) swing and a wider process window. Brewer Science^® ARC^® products facilitate efficient photolithography and enable easy etch integration, and each product is backed by superior technical support and service.

Q. What types of bottom anti-reflective coatings does Brewer Science offer?
A. Brewer Science offers organic spin-on ARC^® products for i-line, KrF (248-nm), and ArF (193-nm) light wavelengths. For each wavelength, both dry-etch and TMAH-soluble materials are available.

Q. How are Brewer Science bottom anti-reflective coatings applied?
A. Brewer Science^® ARC^® products do not typically need adhesion promoters and are spin coated on wafers in the same manner as a photoresist. The coated wafers are then baked between 150°C and 220°C. Next the wafers are processed through the remaining photoresist, exposure, and develop steps.

Q. What are the typical film thicknesses of Brewer Science bottom anti-reflective coatings?
A. The BARC thickness required depends on the optical properties of the photoresist, the substrate, and the BARC and on the wavelength of light used for imaging. Thicknesses range from less than 30 nm to more than 150 nm. The actual thickness required for any process can be determined easily by simulation, which Brewer Science can perform using our proprietary software.

Q. How do I know which Brewer Science product is the right one for my application?
A. Brewer Science has a team of highly qualified applications engineers to assist you with selecting and implementing any of our products.