OptiStack® Customer Advantages

Simplify the overall lithography process

OptiStack® systems simplify the overall lithography process by offering a universal lithography platform that eliminates topography dispersion and maintains optimal optical interfaces in the same focal plane, regardless of the substrate optical properties. This design helps simplify inventory management for our customers because it allows them to process multiple layers using a much narrower set of materials. This technology also helps customers by enabling them to broaden their design rules, increase their speed of design, and simplify their optical proximity correction (OPC) calculation because the same reflectivity is maintained on multiple layers.

Extend resolution limits of existing tools

OptiStack® systems allow customers to use thin resist technology, which will extend the resolution limits of their existing photolithography tool. While the expanded etch capability needed for multilayer processing may require an additional capital investment, this expense is minimal compared to upgrading to the next generation of scanners.

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