Directed self-assembly (DSA) refers to the integration of block copolymer (BCP) materials that undergo phase separation with traditional manufacturing processes. With DSA, nanoscale dimensions are achieved at a drastically reduced cost by novel material designs without additional equipment upgrades.
Alternative lithographic approaches to achieve features ≤10 nanometers in size typically involve higher equipment budgets or extensive multiplication processes. DSA uses existing equipment sets, providing a promising high-volume and cost-effective option to meet true nanomanufacturing resolution requirements.
Directed Self-Assembly at Brewer Science
Common DSA integration uses polystyrene and poly(methylmethacrylate) (PS-b-PMMA) block copolymers that generate half pitches measuring ≥14 nanometers.
At Brewer Science, we have developed BCPs using modified polystyrene block techniques that extend conventional DSA feature sizes from 14 nanometers to as low as 7 nanometers. Combined with our robust neutral layers, we have simplified the path for implementing DSA to attain exceptional photolithographic capabilities.
We’ll discuss our findings in this exciting area at the SPIE Advanced Lithography Conference, February 22 to 26, 2015, in San Jose, California. Please visit our booth and expect more DSA innovation from our outstanding team at Brewer Science.