ProTEK^® PSB, a photosensitive alkaline etch mask, allows bulk silicon micromachining late in the process while preserving the metal stack

With ProTEK^® PSB coating, you can:

• Apply an etch mask over CMOS structures due to low process temperatures
• Reduce processing time because pattern transfer by dry etch is not required as it is with silicon nitride
• Achieve higher throughput by using batch processing instead of a single-wafer DRIE process

ProTEK^® PSB coating is a spin-on replacement for Silicon Nitride or Silicon Oxide wet etch masks. When applied in combination with ProTEK^® B3 coating, it offers a full solution to alkaline wet etching. It can be applied after the CMOS circuitry is created and does not require mechanical clamps for protection.

Brewer Science^® ProTEK^® PSB coating is used in the creation of inverse pyramidal pits as discussed in SUN Microsystems’ technical paper, “Active Demonstration of a Passively Self-Aligned, Multi-Chip Package using Proximity Communication in a Switching Fabric,” presented at the 42nd Annual International Symposium on Microelectronics - IMAPS 2009, San Jose, December 1-5, 2009.