Patents
Brewer Science has been a technology leader in the fields of specialty chemicals and equipment for micro- and optoelectronics since 1981. By creating innovative products and technologies, Brewer Science maintains a competitive edge in new and future markets. Constant innovative efforts are captured in the "By the technology" portion of our vision statement. Patents for Brewer Science technologies have also been filed and issued internationally. Some patents are available for licensing.
Brewer Science U.S. Patents
Anti-Reflective Coatings
| 8,383,318 | Acid-sensitive, developer-soluble bottom anti-reflective coatings |
| 8,257,910 | Underlayers for EUV lithography |
| 7,998,318 | Crosslinkable fill compositions for uniformly protecting via and contact holes |
| 7,914,974 | Anti-reflective imaging layer for multiple patterning process |
| 7,754,818 | Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers |
| 7,745,540 | Gap-fill materials and bottom anti-reflective coatings comprising hyperbranched polymers |
| 7,608,380 | Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
| 7,601,483 | Anti-reflective coatings using vinyl ether crosslinkers |
| 7,507,783 | Thermally curable middle layer comprising polyhedral oligomeric silsesquioxanes for 193-nm trilayer resist process |
| 7,364,835 | Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| 7,323,289 | Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 7,261,997 | Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
| 7,132,219 | Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 7,132,216 | Non-aromatic chromophores for use in polymer anti-reflective coatings |
| 7,108,958 | Photosensitive bottom anti-reflective coating |
| 7,038,328 | Anti-reflective compositions comprising triazine compounds |
| 7,026,237 | Fill material for dual damascene processes |
| 6,962,769 | Anti-reflective coating composition with improved spin bowl compatibility |
| 6,894,104 | Anti-reflective coatings and dual damascene fill compositions comprising stryrene-allyl alcohol copolymers |
| 6,893,684 | Anti-reflective coating compositions for use with low-k dielectric materials |
| 6,872,506 | Wet-developable anti-reflective compositions |
| 6,846,612 | Organic anti-reflective coating compositions for advanced microlithography |
| 6,680,160 | Halogenated anti-reflective coatings |
| 6,670,425 | Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings |
| 6,663,916 | Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings |
| 6,653,411 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,576,408 | Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose |
| 6,555,287 | Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings |
| 6,524,708 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,512,084 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,495,305 | Halogenated anti-reflective coatings |
| 6,444,320 | Thermosetting anti-reflective coatings for full fill dual damascene process |
| 6,432,611 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,403,152 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,399,686 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,391,472 | Fill material for dual damascene process |
| 6,323,310 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| 6,316,160 | Fast-etching, thermosetting anti-reflective coatings derived from cellulosic binders |
| 6,156,479 | Thermosetting anti-reflective coatings |
| 6,080,530 | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 6,042,990 | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 5,935,760 | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| 5,919,599 | Thermosetting anti-reflective coatings at deep ultraviolet |
| 5,919,598 | Method for making multilayer resist structures with thermosetting anti-reflective coatings |
| 5,892,096 | Non-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility |
| 5,693,691 | Thermosetting anti-reflective coatings compositions |
| 5,688,987 | Non-subliming mid-UV dyes and ultra-thin organic anti-reflective coatings having differential solubility |
| 5,674,648 | Anti-reflective coating |
| 5,578,676 | Method for making polymers with intrinsic light-absorbing properties |
| 5,368,989 | Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating |
Multilayer Systems
| 8,415,083 | On-track process for patterning hardmask by multiple dark field exposures |
| 8,206,893 | Photoimageable branched polymer |
| 8,168,372 | Method of creating photolithographic structures with developer-trimmed hardmask |
| 8,133,659 | On-track process for patterning hardmask by multiple dark field exposures |
| 7,939,244 | Photosensitive hardmask for microlithography |
| 7,602,066 | Method of filling structures for forming via-first dual damascene interconnects |
| 7,449,230 | Lithography pattern shrink process and articles |
| 7,364,832 | Wet developable hard mask in conjunction with thin photoresist for microphotolithography |
| 7,348,281 | Method of filling structures for forming via-first dual damascene interconnects |
| 7,122,296 | Lithography pattern shrink process and articles |
| 6,740,469 | Developer-soluble metal alkoxide coatings for microelectronic applications |
Protective Coatings
| 8,445,591 | Spin-on protective coatings for wet-etch processing of microelectronic substrates |
| 8,399,346 | Scratch-resistant coatings for protecting front-side circuitry during backside processing |
| 8,268,449 | Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive |
| 8,202,442 | Spin-on protective coatings for wet-etch processing of microelectronic substrates |
| 8,192,642 | Spin-on protective coatings for wet-etch processing of microelectronic substrates |
| 7,758,913 | Spin-on protective coatings for wet-etch processing of microelectronic substrates |
| 7,709,178 | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| 7,695,890 | Negative photoresist for silicon KOH etch without silicon nitride |
| 7,678,861 | Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive |
| 7,316,844 | Spin-on protective coatings for wet-etch processing of microelectronic substrate |
Temporary Bonding Solutions
| 8,236,669 | High-temperature spin-on temporary bonding compositions |
| 8,221,571 | Cyclic olefin compositions for temporary wafer bonding |
| 8,092,628 | Cyclic olefin compositions for temporary wafer bonding |
| 7,935,780 | High-temperature spin-on temporary bonding compositions |
| 7,713,835 | Thermally decomposable spin-on bonding compositions for temporary wafer bonding |
Carbon Nanotube Materials
[Patents pending]
Planarizing Materials
| 7,790,231 | Automated process and apparatus for planarization of topographical surfaces |
| 7,455,955 | Planarization method for multi-layer lithography processing |
| 6,716,767 | Contact planarization materials that generate no volatile byproducts or residue during curing |
Processing Equipment
| 8,408,222 | Device for coating the outer edge of a substrate during microelectronics manufacturing |
| 7,775,785 | Contact planarization apparatus |
| 7,579,044 | Process and device for coating the outer edge of a substrate during microelectronics manufacture |
Other Technologies
| 7,976,894 | Materials with thermally reversible curing mechanism |
| 7,833,692 | Amine-arresting additives for materials used in photolithographic processes |
| 7,803,458 | Hybrid organic-inorganic polymer coatings with high refractive indices |
| 7,749,603 | Two-layer transparent electrostatic charge dissipating coating |
| 7,608,342 | Photocurable, conductive, transparent polymer coatings |
| 7,192,999 | Polyimides for use as high refractive index, thin film materials |
| 6,303,270 | Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor |
| 5,998,090 | High optical density ultra thin organic black matrix system |
| 5,629,665 | Conducting-polymer bolometer |
For information on international patents, please contact Brewer Science by using this email form or by calling +573.364.0300 (USA).