Brewer Science® ARC® anti-reflective coatings improve the photolithographic process, enabling fine resolution of photoresist features.
Brewer Science is the expert in manufacturing and implementing anti-reflective coatings for the semiconductor industry. Our line of products stretches across the whole spectrum of wavelengths and is the most comprehensive product line-up in the industry.
About ARC® coatings
Bottom anti-reflective coatings (ARC®) are polymer based liquid chemistries that have three primary functions in the creation of a semiconductor.
- The light absorbing chemistry controls light as it passes through the photoresist during the photolithography stage of chip manufacturing. The result is a dampening of reflected light on the surfaces and inside the material (destructive interference).
- Reduces or eliminates reflective notching and standing waves and doesn't need additional adhesion promoter.
- The liquid chemistry typically flattens surface topography.
Spin coating BARC can increase depth of focus and reduce reflective notching.
By using anti-reflective coatings, semiconductor chip manufacturers have been able to push their process windows to create the smaller features that today's consumers have come to expect.