The challenge of reduced feature sizes is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193-nm photo process.

Brewer Science ARC^® 162B Coating

Avoid unscheduled maintenance of your coat/bake module by making ARC^® 162B coating your low-outgassing, fast-etch process of record.

Brewer Science ARC^® 100-Series Coatings

ARC^® 100-series coatings are a series of 193-nm BARCs that are modifiable to meet a specific k value. Tunable-k ARC^® 100 BARCs give the microlithography engineer the opportunity to select a BARC with the precise optical requirements needed for optimal substrate reflectivity control. BARCs with k values range for 0.13 to 0.47 can be manufactured using the same chemical backbones, to produce a product designed to match the reflectivity control requirements for your stack.

Brewer Science ARC^® 29SR Coating

ARC^® 29SR coating is a leading anti-reflective coating for 193-nm photolithography. This 2nd minimum material is compatible with a broad range of ArF photoresists. It is available in formulations for 200-mm and 300-mm processes.

All ARC^® products are PFOS Free, for your health and the safety of the environment.