193-nm (ArF) Anti-Reflective Coatings
The challenge of reduced feature sizes is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193-nm photo process.
- ARC® 162B coating improves wafer throughput and conserves etch budget for a wide range of 193-nm lithography layers
- ARC® 100 Coating Series provides broad photoresist compatibility with ultra low outgassing performance in 193-nm lithography
- ARC® 29SR coating provides broad photoresist compatibility and improved outgassing performance in 193-nm lithography