193-nm (ArF) Anti-Reflective Coatings

The challenge of reduced feature sizes is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193-nm photo process.

ARC® 162B Coating

  • ARC® 162B coating improves wafer throughput and conserves etch budget for a wide range of 193-nm lithography layers

ARC® 100-Series Coatings

  • ARC® 100 Coating Series provides broad photoresist compatibility with ultra low outgassing performance in 193-nm lithography

ARC® 29SR Coating

  • ARC® 29SR coating provides broad photoresist compatibility and improved outgassing performance in 193-nm lithography

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