Directed self-assembly

Directed self-assembly (DSA) is an exciting new technology that uses specially designed block copolymers​ to form IC patterns on a molecular scale.

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Directed self-assembly (DSA) is gaining a lot of traction in the semiconductor industry as a leading-edge technique for next-generation lithography. By harnessing the thermodynamic properties of block copolymers, lithography engineers can create sub–22 nm features without the need for EUV equipment or numerous multipatterning steps.

Brewer Science is actively developing materials and processes for the most advanced DSA schemes, including high-χ (high-chi) block copolymers that enable feature sizes of less than 10 nm.