XHRiC Advanced i-Line Anti-Reflective Coating

XHRiC coating provides optimal CD control for i-line applications with low topography (less than 350 nm)

The XHRiC series of anti-reflective coatings has been specifically designed for advanced i-line dry patterning processes. The materials are highly absorbent with n-values of 1.81 and k-values of 0.34, providing excellent CD control by eliminating standing waves and reflective notching. These highly robust products have been successfully utilized in a wide range of processes at poly, gate and metalization levels for 0.25µm design rules.

Features:

  • Proven compatibility with nearly all i-line resists
  • Demonstrated with the newest generation of resists
  • Planar, thermal crosslinking BARC
  • Spin bowl, drain compatible with EBR processes
  • Optical properties are optimized for i-line performance
  • Ultra low particle counts
  • Low metal ions.

XHRIC Anti-Reflective Coating
XHRiC

Brewer Science Products are PFOS freeAll ARC® products are PFOS Free, for your health and the safety of the environment.

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