Lithography

Advanced Lithography

Brewer Science lithography products have been shaping the semiconductor industry since 1981. Over the years, new product lines, capabilities, and specifications have been improved to deliver the best

Top Anti-reflective Coatings vs Bottom Anti-reflective Coatings

EUV

The biggest problem facing lithographers using EUV is the RLS trade-off: simultaneous improvement of resolution, line width roughness, and photosensitivity.

Directed self-assembly

Brewer Science is actively developing materials and processes for the most advanced DSA schemes, including high-χ (high-chi) block copolymers that enable feature sizes of less than 10 nm.

Multilayer Systems

​OptiStack® multilayer systems are our flagship lithography technology, and are used for leading-edge high volume IC manufacturing.

ARC® anti-reflective coating

ARC® anti-reflective coatings are the industry benchmark for reflection control and light absorption during photolithography.