Semiconductor Manufacturing Technology
In 1981, Brewer Science invented and introduced ARC® anti-reflective coatings to the marketplace. Brewer Science has maintained a dominant share in the global bottom anti-reflective materials market through our cutting-edge technologies.
Brewer Science® ARC® anti-reflective coating technology has fundamentally and significantly enhanced the lithography process, which is key for enabling the manufacture of many generations of microelectronics devices. ARC® materials provide a unique pathway to extend photolithography equipment capabilities and save on capital investment, allowing its customers to break through the 1-µm feature barrier without the need for new tools.
The ARC® product line is designed to improve reflective notching and standing waves that are created by reflection from the substrate during the lithography step. Additionally, the enhanced optical control improves the cost of ownership while meeting the needs of ever-shrinking technology. Materials based on ARC® material technology have grown to become a standard in photolithography patterning, enhancing features and tool capabilities through every subsequent technology node.
The ARC® technologies have been expanded with materials and process systems for:
- Immersion lithography
- Double patterning
- Developer-soluble bottom anti-reflective coatings (DBARCs)
- EUV lithography
- Brewer Science® OptiStack® system
These innovative systems enable IC manufacturers to achieve:
- Significant yield improvements
- Improved consistency wafer-to-wafer, and die-to-die
- Lithography tool extension
Brewer Science® semiconductor technologies enhance processes such as:
- Front End Of Line (FEOL)
- Back End Of Line (BEOL)
- III-V Semiconductor