Publications

2014


Douglas J. Guerrero, "Extending lithography with advanced materials," Proceedings of SPIE, vol. 9051, 2014, pp. 905114-1 - 905114-10.


Mary Ann Hockey, Kui Xu, Yubao Wang, Douglas J. Guerrero, and Eric Calderas, "Streamlined etch integration with a unique neutral layer for self-assembled block copolymers (BCPs)," Proceedings of SPIE, vol. 9049, 2014, pp. 90492A-1 - 90492A-7.


Vijaya Kayastha, Stephen Gibbons, and Ryan Giedd, "Ultrafast integrated humidity and temperature sensor based on carbon nanotubes, and a sensor controller system," Nanotech 2014, vol. 1, 2014, pp. 1-4.


James E. Lamb III, Stephen Gibbons, Ram Trichur, Yongqing Jiang, Kay Mangelson, Kathryn Kremer, and Dan Janzen, "Advancements in microelectronics-grade carbon nanotube materials for NRAM® device manufacture and analysis of carbon nanotube mass in end user devices," Nanotech 2014, vol. 3, 2014, pp. 194-197.


Christopher W. Landorf, Joshua Alford, Jacqueline Garrison, Stephen Gibbons, Wu-Sheng Shih, Benjamin J. Leever, and John D. Berrigan, "Extremely flexible and stretchable carbon nanotube composites for conformal electronic devices," Nanotech 2014, vol. 1, 2014, pp. 340-343.


A. Romo-Negreira, T.R. Younkin, R. Gronheid, S. Demuynck, N. Vandenbroeck, T. Seo, D.J. Guerrero, D. Parnell, M. Muramatsu, K. Shinichiro, Y. Takashi, K. Nafus, and M.H. Somervell, "Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: A study of substrate and template affinity control," Proceedings of SPIE, vol. 9049, 2014, pp. 90491L-1 - 90491L-11.


Jeffery Steevens, Mark Chappell, Dan Janzen, Stephen Gibbons, Doyle Edwards, and Wu-Sheng Shih, "Outwitting the uncertainty of nanotechnology risks through environmental life cycle assessment," Nanotech 2014, vol. 3, 2014, pp. 113-114.


Zhimin Zhu, Joyce Lowes, John Berron, Brian Smith, and Dan Sullivan, "Spin-coating defect theory and experiments," ECS Transactions, vol. 60, no. 1, 2014, pp. 293-302.

2013


Pavan Bhatia, Roberta Hawkins, Jan Campbell, Martin Ivie, Alex Smith, Mark Privett, and Gary Brand, "Meeting the fabrication challenges for backside processing on thin substrates with ultrahigh device topography," CS MANTECH Online Digest, May 13-16, 2013, pp. 51-54.


Nick Brakensiek and Michael Cronin, "Point-of-use filter membrane selection, start-up, and conditioning for low-defect photolithography coatings," Proceedings of SPIE, vol. 8682, 2013, pp. 868228-1 - 868228-9.


Nick Brakensiek and Michael Sevegney, "Effects of dispense equipment sequence on process start-up defects," Proceedings of SPIE, vol. 8682, 2013, pp. 86822A-1 - 86822A-8.


Liyong Diao, James Lamb, Stephen Gibbons, Wu-Sheng Shih, and Ryan Giedd, "Decoupled temperature and moisture sensor made of CNT-based nanomaterials on flexible plastic substrates," Nanotech 2013, vol. 2, 2013, pp. 84-87.


Michelle Fowler, "Bonding material properties from a 3D IC perspective," Chip Scale Review, September-October 2013, pp. 30-33.


Douglas Guerrero, Mary Ann Hockey, Yubao Wang, and Eric Calderas, "Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning," Proceedings of SPIE, vol. 8680, 2013, pp. 86801P-1 - 86801P-9.


Aaron Jacobs, Mark Privett, and Gary Brand, "Temporary bonding material total thickness variation (TTV)," International Wafer-Level Packaging Conference (IWLPC) Proceedings, November 5-7, 2013, pp. [unnumbered].


Anne Jourdain, Alain Phommahaxay, Greet Verbinnen, Gayle Murdoch, Andy Miller, Kenneth Rebibis, Alice Guerrero, Jeremy McCutcheon, Mark Privett, Jason Neidrich, Gerald Beyer, and Eric Beyne, "Integration and manufacturing aspects of moving from WaferBOND HT-10.10 to ZoneBOND material in temporary wafer bonding and debonding for 3D applications," IEEE Electronic Components and Technology Conference (ECTC), May 28-31, 2013, pp. 113-117.


Vijaya Kayastha, Carissa Jones, Wu-Sheng Shih, and Christopher Landorf, "Functionalized carbon nanotube–based sensors for detecting a trace quantity of 2,4-dinitrotoluene explosive vapors, with selectivity," Nanotech 2013, vol. 1, 2013, pp. 268-271.


Alvin Lee, Jay Su, H.H. Chang, C.H. Chien, Bor Kai Wang, Leon Tsai, and Aric Shorey, "Optimization for temporary bonding process in PECVD passivated micro-bumping technology," IEEE Electronics Packaging Technology Conference (EPTC), 2013, pp. 678-681.


Xavier Thrun, Kang-Hoon Choi, Norbert Hanisch, Christoph Hohle, Katja Steidel, Douglas Guerrero, Thiago Figueiro, and Johann W. Bartha, "Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography," Proceedings of SPIE, vol. 8682, 2013, pp. 86820Z-1 - 86820Z-10.


Michael Weigand, Vandana Krishnamurthy, Yubao Wang, Qin Lin, Douglas Guerrero, Sean Simmons, and Brandy Carr, "Evaluating spin-on carbon materials at low temperatures for high wiggling resistance," Proceedings of SPIE, vol. 8685, 2013, pp. 86850R-1 - 86850R-9.


Zhimin Zhu, Michael Weigand, Vandana Krishnamurthy, and Daniel Sullivan, "Robust trilayer patterning technique," ECS Transactions, vol. 52, no. 1, 2013, pp. 251-257.

2012


Dongshun Bai, Michelle Fowler, Curtis Planje, and Xie Shao, "Planarization of deep structures using self-leveling materials," IMAPS 2012 - 45th International Symposium on Microelectronics, September 9-13, 2012, pp. 79-83.


Liyong Diao, Wu-Sheng Shih, and James E. Lamb III, "Fabrication and characterization of CNT inductors on flexible plastic substrates," Nanotech 2012, vol. 1, 2012, pp. 213-216.


Michelle Fowler, Dongshun Bai, Curt Planje, and Xie Shao, "High-aspect-ratio planarization using self-leveling materials," IMAPS International Conference and Exhibition on Device Packaging, March 5-8, 2012, pp. 412-415.


Mary Ann Hockey, Qin Lin, and Eric Calderas, "How much further can lithography process windows be improved?," Proceedings of SPIE, vol. 8328, 2012, pp. 83280Q-1 - 83280Q-10.


Vijaya Kayastha, Carissa Jones, Joseph Demster, Cory Horner, Mariana Nelson, and James Lamb, "Optimization of carbon nanotube thin-film transistor fabrication," Nanotech 2012, vol. 1, 2012, pp. 240-243.


Tantiboro Ouattara, Carlton Washburn, Aline Collin, Vandana Krishnamurthy, Douglas Guerrero, and Michael Weigand, "EUV assist layers for use in multilayer processes," Proceedings of SPIE, vol. 8322, 2012, pp. 83222E-1 - 83222E-7.


Alain Phommahaxay, Anne Jourdain, Greet Verbinnen, Tobias Woitke, Peter Bisson, Markus Gabriel, Walter Spiess, Alice Guerrero, Jeremy McCutcheon, Rama Puligadda, Pieter Bex, Alex Van den Eede, Bart Swinnen, Gerald Beyer, Andy Miller, and Eric Beyne, "Ultrathin wafer handling in 3D stacked IC manufacturing combining a novel ZoneBOND™ temporary bonding process with room temperature peel debonding," IEEE International 3D Systems Integration Conference (IEEE 3DIC), January 31-February 2, 2012, pp. 1-4 (paper 1-2).


Mark Privett, "3D IC thin wafer handling materials requirements," Chip Scale Review, November-December 2012, pp. 24-27.


Mark Privett, "3D technology platform: Temporary bonding and release," 3D Integration for VLSI Systems, 2012, pp. 121-138.


Rama Puligadda, "Temporary bonding for enabling three-dimensional integration and packaging," Handbook of Wafer Bonding, 2012, pp. 329-345.


Carlton Washburn, Tantiboro Ouattara, Aline Collin, Vandana Krishnamurthy, and Douglas Guerrero, "Throughput increases using EUV assist layers," ECS Transactions, vol. 44, no. 1, 2012, pp. 215-218.

2011


Nick Brakensiek, Jennifer Braggin, John Berron, Raul Ramirez, Karl Anderson, and Brian Smith, "Improving material-specific dispense processes for low-defect coatings," Proceedings of SPIE, vol. 7972, 2011, pp. 79722Z-1 - 79722Z-7.


Guiru Gu, Yunfeng Ling, Runyu Liu, Puminun Vasinajindakaw, Xuejun Lu, Carissa S. Jones, Wu-Sheng Shih, Vijaya Kayastha, Nick L. Downing, Xuliang Han, Harish Subbaraman, Dan Pham, Ray T. Chen, Maggie Yihong Chen, Urs Berger, and Mike Renn, "All-printed thin-film transistor based on purified single-walled carbon nanotubes with linear response," Journal of Nanotechnology, vol. 2011, 2011, pp. article ID 823680, 4 pages.


Douglas J. Guerrero, Vandana Krishnamurthy, and Daniel M. Sullivan, "BARC surface property matching for negative-tone development of a conventional positive-tone photoresist," Proceedings of SPIE, vol. 7972, 2011, pp. 79720Q-1 - 79720Q-7.


Molly Hladik, "Novel chemistry and dispersive techniques for diverse CNT applications," Nanotech 2011: Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, 2011, pp. 547-549.


James E. Lamb III, Chris Cox, Zhimin Zhu, David Drain, and Daniel Sullivan, "Foundry efficiency gains through common photolithography themes," ECS Transactions, vol. 34, no. 1, 2011, pp. 243-248.


Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, and Cherry Tang, "Implementation of KrF DBARCs for implant applications on advanced lithography nodes," Proceedings of SPIE, vol. 7972, 2011, pp. 797227-1 - 797227-10.


Jeremy W. McCutcheon, Debbie L. Blumenshine, and Alvin Lee, "Advanced processes and materials for temporary wafer bonding," IEEE Electronics Packaging Technology Conference (EPTC), 2011, pp. 744-746.


Michael Swope, Vandana Krishnamurthy, Zhimin Zhu, Daniel Sullivan, Sean Simmons, Chris Cox, Randy Bennett, and Cheryl Nesbit, "Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography," Proceedings of SPIE, vol. 7972, 2011, pp. 79722H-1 - 79722H-7.


Stephen Turner, "Advancements in ink-jet deposition of carbon nanotube materials for printed electronics," Nanotech 2011: Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, 2011, pp. 558-561.


C. Washburn, J.A. Lowes, and A. Guerrero, "Use of DBARCs beyond implant," ECS Transactions, vol. 34, no. 1, 2011, pp. 249-255.

2010


Brandy Carr, April Evers, Marc Weimer, Brian Smith, and Jeff Leith, "Minimizing the outgassing of spin-coated organic materials to reduce defects," Proceedings of SPIE, vol. 7638, 2010, pp. 763823-1 - 763823-7.


D.J. Guerrero, D.M. Sullivan, Z. Zhu, and R.L. Mercado, "Simulation and experimental study on multilayer double-patterning processes," ECS Transactions, vol. 27, no. 1, 2010, pp. 473-378.


Carissa S. Jones, Xuejun Lu, Mike Renn, Mike Stroder, and Wu-Sheng Shih, "Aerosol-jet-printed, high-speed, flexible thin-film transistor made using single-walled carbon nanotube solution," Microelectronic Engineering, vol. 87, no. 3, 2010, pp. 434-437.


Vijaya K. Kayastha, Carissa S. Jones, Wu-Sheng Shih, and Michael J. Renn, "Next-generation sensing material and device printing technology for sensor applications," International Symposium on Spectral Sensing Research (ISSSR), June 21-24, 2010, pp. [unnumbered].


Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo L. Mercado, and Mark Slezak, "Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications," Proceedings of SPIE, vol. 7639, 2010, pp. 76390K-1 - 76390K-11.


J. Lowes, C. Stroud, A. Guerrero, C. Washburn, and P. Raj, "Comparative study of photosensitive versus non-photosensitive developer-soluble bottom anti-reflective coating systems," ECS Transactions, vol. 27, no. 1, 2010, pp. 503-508.


Jim D. Meador, Alice Guerrero, Joyce A. Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, and Ramil-Marcelo L. Mercado, "Photoresist-induced development behavior in DBARCs," Proceedings of SPIE, vol. 7639, 2010, pp. 763926-1 - 763926-10.


Jeremy McCutcheon, Robert Brown, and JoElle Dachsteiner, "ZoneBOND thin wafer support process for wafer bonding applications," Journal of Microelectronics and Electronic Packaging, vol. 7, no. 3, 2010, pp. 138-142.


Jeremy McCutcheon and Dongshun Bai, "Advanced thin wafer support processes for temporary wafer bonding," IMAPS 2010 - 43rd International Symposium on Microelectronics, 2010, pp. 361-363.


Brian Smith, Steve McGarvey, Zhimin Zhu, Yubao Wang, and Dan Sullivan, "High-resolution defect metrology for silicon BARC analysis," Proceedings of SPIE, vol. 7638, 2010, pp. 763824-1 - 763824-8.


Brian Smith, Raul Ramirez, Jennifer Braggin, Aiwen Wu, Karl Anderson, John Berron, Nick Brakensiek, and Carlton Washburn, "Improving material-specific dispense processes for low-defect coatings," Proceedings of SPIE, vol. 7639, 2010, pp. 763929-1 - 763929-6.


Tingji Tang, Curt Planje, Ramachandran K. Trichur, Shelly Fowler, Kimberly Yess, Xie Shao, and Daniel J. Vestyck, "Novel polymeric protective coatings for hydrofluoric acid vapor etching during MEMS release etch," IMAPS Device Packaging Conference, March 8-10, 2010, pp. 000076-000080.


R.K. Trichur, M. Fowler, J.W. McCutcheon, and M. Daily, "Filling and planarizing deep trenches with polymeric material for through-silicon via technology," IMAPS 2010 - 43rd International Symposium on Microelectronics, 2010, pp. 192-196.

2009


Dongshun Bai, Xing-Fu Zhong, Rama Puligadda, Jurgen Burggraf, Daniel Burgstaller, Chris Lypka, and James Verzosa, "Edge protection of temporarily bonded wafers during backgrinding," ECS Transactions, vol. 18, no. 1, 2009, pp. 757-762.


J. Charbonnier, S. Cheramy, D. Henry, A. Astier, J. Brun, N. Sillon, A. Jouve, S. Fowler, M. Privett, R. Puligadda, J. Burggraf, and S. Pargfrieder, "Integration of a temporary carrier in a TSV process flow," 59th Electronic Components and Technology Conference (IEEE ECTC), May 26-29, 2009, pp. 865-871.


Douglas J. Guerrero, Daniel M. Sullivan, and Ramil-Marcelo L. Mercado, "Resist double patterning on BARCs and spin-on multilayer materials," Proceedings of SPIE, vol. 7520, 2009, pp. 75200M-1 - 75200M-8.


Douglas J. Guerrero, Hao Xu, Ramil Mercado, and James Blackwell, "Underlayer designs to enhance EUV resist performance," Journal of Photopolymer Science and Technology, vol. 22, no. 1, 2009, pp. 117-122.


A. Jouve, W. Hong, D. Blumenshine, J. Dachsteiner, R. Puligadda, D. Bai, J. Diaz, and D. Henry, "Material improvement for ultrathin-wafer handling in TSV creation and PECVD process," IEEE Conference on 3D System Integration, September 28-30, 2009, pp. unnumbered.


Stephen M. June, Takeo Suga, William H. Heath, Qin Lin, Rama Puligadda, and Timothy E. Long, "2-Nitro-p-xylene glycol as a functional monomer for photoreleasable adhesion," Polymer Preprints, vol. 50, no. 2, 2009, pp. 424-425.


Stephen M. June, Takeo Suga, William H. Heath, Qin Lin, Rama Puligadda, and Timothy E. Long, "Photoactive poly(siloxane imides) as high performance structural adhesives with tailorable interfacial strength," Polymer Preprints, vol. 50, no. 2, 2009, pp. 841-842.


Darron Jurajda, Enrico Tenaglia, Jonathan Jeauneau, Danilo De Simone, Zhimin Zhu, Paolo Piazza, Paolo Piacentini, and Paolo Canestrari, "Investigation of the foot-exposure impact in hyper-NA immersion lithography when using thin anti-reflective coating," Proceedings of SPIE, vol. 7273, 2009, pp. 72730Z-1 - 72730Z-10.


J. Macie, D. Miranda, Z. Zhu, and B. Smith, "Optimizing lithographic stack materials when using hyper-NA exposure tools," Solid State Technology, January vol. 52, no. 1, 2009, pp. [online].


Jim D. Meador, Joyce A. Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo L. Mercado, Victor Pham, and Mark Slezak, "Improving the performance of light-sensitive developer-soluble anti-reflective coatings by using adamantyl terpolymers," Proceedings of SPIE, vol. 7273, 2009, pp. 727312-1 - 727312-9.


Charles J. Neef, Brian Smith, Chris James, Zhimin Zhu, and Michael Weigand, "Effects of carbon/hardmask interactions on hardmask performance," Proceedings of SPIE, vol. 7273, 2009, pp. 727311-1 - 727311-7.


Carlton Washburn, April Evers, and Brian Smith, "Residue testing of developer-soluble bottom anti-reflective coatings," ECS Transactions, vol. 18, no. 1, 2009, pp. 419-425.


Thomas Werner, Johann Steinmetz, Michael Kiene, Björn Eggenstein, Frank Richter, Frank Kahlenberg, Simon Heghoyan, Darron Jurajda, and Daniel Sullivan, "Using soluble gap-fill materials in VFTL integration," Solid State Technology, August vol. 52, no. 8, 2009, pp. [online].


Hao Xu, James M. Blackwell, Todd R. Younkin, and Ke Min, "Underlayer designs to enhance the performance of EUV resists," Proceedings of SPIE, vol. 7273, 2009, pp. 72731J-1 - 72731J-11.


Zhimin Zhu, Emil Piscani, Yubao Wang, Jan Macie, Charles J. Neef, and Brian Smith, "Thin hardmask patterning stacks for the 22-nm node," Proceedings of SPIE, vol. 7274, 2009, pp. 72742K-1 - 72742K-7.

2008


Dongshun Bai, Wenbin Hong, JoElle Dachsteiner, Amadine Jouve, Rama Puligadda, Chad Brubaker, and Tian Tang, "Temporary wafer bonding materials with adjustable debonding properties for use in high-temperature processing," IMAPS 2008: Proceedings of the International Microelectronics and Packaging Society 41st International Symposium on Microelectronics, 2008, pp. 222-227.


Chad Brubaker, Shelly Fowler, and John Romain, "Non-destructive method for evaluation of thin wafer edge protection," International Wafer-Level Packaging Conference (IWLPC) Proceedings, October 13-16, 2008, pp. unnumbered.


J. Dalvi-Malhotra, X.F. Zhong, and C. Planje, "Photosensitive etch protection coating for silicon wet-etch applications," Proceedings of SPIE, vol. 6884, 2008, pp. 68840J-1 - 68840J-8.


J. Dalvi-Malhotra, X.F. Zhong, C. Planje, G. Brand, and K. Yess, "A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon," Journal of Micromechanics and Microengineering, vol. 18, no. 2, 2008, pp. 025029-1 - 025029-8.


J. Dalvi-Malhotra, X.F. Zhong, C. Planje, and K. Yess, "Application of advanced photosensitive etch protection coating," IMAPS Device Packaging Conference, March 17-20, 2008, pp. unnumbered.


Douglas J. Guerrero, "Anti-reflective coatings: From ground breaking concept to mature industry," [Newsletter of] The Technical Association of Photopolymers, Japan, no. 44, 2008, pp. 1-3.


Douglas J. Guerrero, Carol Beaman, Rikimaru Sakamoto, Takafumi Endo, and Bang-Ching Ho, "Organic underlayers for EUV lithography," Journal of Photopolymer Science and Technology, vol. 21, no. 3, 2008, pp. 451-455.


Douglas J. Guerrero, Steve Gibbons, Joyce Lowes, and Ramil Mercado, "Anti-reflective coating for multipatterning lithography," Proceedings of SPIE, vol. 6923, 2008, pp. 69230X-1 - 69230X-7.


Runhui Huang and Michael Weigand, "Plasma etch properties of organic BARCs," Proceedings of SPIE, vol. 6923, 2008, pp. 69232G-1 - 69232G-9.


A. Jouve, S. Fowler, M. Privett, R. Puligadda, D. Henry, A. Astier, J. Brun, M. Zussy, N. Sillon, J. Burggraf, and S. Pargfrieder, "Facilitating ultrathin wafer handling for TSV processing," 10th IEEE Electronics Packaging Technology Conference (EPTC), 2008, pp. 45-50.


James Lamb, Bloh Kim, and Stefan Pargfrieder, "Temporary bonding/debonding for ultrathin substrates," Solid State Technology, vol. 51, no. 7, 2008, pp. .


Joyce Lowes, Ramil Mercado, Jim Meador, Chris Cox, and Douglas Guerrero, "Novel developer-soluble anti-reflective coatings for 248-nm lithography," ISTC2008, Proceedings of the 7th International Conference on Semiconductor Technology, 2008, pp. 255-259.


Jeremy McCutcheon, Louis McCarthy, and JoElle Dachsteiner, "NIR imaging of bond integrity for wafer bonding applications," International Wafer-Level Packaging Conference (IWLPC) Proceedings, October 13-16, 2008, pp. 113-116.


Jim D. Meador, Carol Beaman, Charlyn Stroud, Joyce A. Lowes, Zhimin Zhu, Douglas J. Guerrero, Ramil-Marcelo L. Mercado, and David Drain, "Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography," Proceedings of SPIE, vol. 6923, 2008, pp. 69232W-1 - 69232W-11.


Ramil-Marcelo L. Mercado, Hao Xu, Joyce A. Lowes, Jim D. Meador, and Douglas J. Guerrero, "Acid-degradable hyperbranched polymer and its application in bottom anti-reflective coatings," Proceedings of SPIE, vol. 7140, 2008, pp. 71402W-1 - 71402W-11.


Charles J. Neef, Jim Finazzo, Cheryl Nesbit, and Michael Weigand, "Effects of bake temperature and surface modifications on hardmask materials for trilayer applications," Proceedings of SPIE, vol. 6923, 2008, pp. 692331-1 - 692331-9.


Mark Privett, Franz Murauer, Jürgen Burggraf, Stefan Pargfrieder, and Chad Brubaker, "TSV thinned wafer debonding process optimization," International Wafer-Level Packaging Conference (IWLPC) Proceedings, October 13-16, 2008, pp. 144-148.


Rama Puligadda and Doyle Edwards, "High-performance adhesives facilitate ultrathin wafer handling," Future Fab International, vol. 24, 2008, pp. 107-110.


Wu-Sheng Shih, Jiro Yota, and Ketan Itchhaporia, "CON-TACT planarization process of spin-on dielectrics for device fabrication," Journal of the Electrochemical Society, vol. 155, no. 4, 2008, pp. G65-G71.


Sam X. Sun, Brian A. Smith, and Anwei Qin, "Wet trimming process for critical dimension reduction," Proceedings of SPIE, vol. 6923, 2008, pp. 692336-1 - 692336-11.


Ramachandran K. Trichur and Xie Shao, "A photosensitive, spin-applied masking material for through-silicon via formation for wafer-level packaging," Proceedings of SMTA International Conference and Exhibition, August 17-21, 2008, pp. unnumbered.


Jarrod Vaillancourt, Xuejun Lu, Xuliang Han, Daniel C. Janzen, and Wu-Sheng Shih, "High-speed transparent flexible electronics," Proceedings of SPIE, vol. 6940, 2008, pp. 69403A-1 - 69403A-6.


Jarrod Vaillancourt, Haiyan Zhang, Puminun Vasinajinakaw, Haitao Xia, Xuejen Lu, Xuliang Han, Daniel C. Janzen, Wu-Sheng Shih, Carissa S. Jones, Mike Stroder, Maggie Yihong Chen, Harish Subbaraman, Ray T. Chen, Urs Berger, and Mike Renn, "All ink-jet-printed carbon nanotube thin-film transistor on a polyimide substrate with an ultrahigh operating frequency of over 5 GHz," Applied Physics Letters, vol. 93, 2008, pp. 243301-1 - 243301-3.


Gu Xu and Frank D. Blum, "Surfactant-enhanced free radical polymerization of styrene in emulsion gels," Polymer, vol. 49, 2008, pp. 3233-3238.


Zhimin Zhu, Emil Piscani, Kevin Edwards, and Brian Smith, "Reflection control in hyper-NA immersion lithography," Proceedings of SPIE, vol. 6924, 2008, pp. 69244A-1 - 69244A-7.

2007


J. Dalvi-Malhotra, G.J. Brand, and X.-F. Zhong, "Use of silane-based primer on silicon wafers to enhance adhesion of edge-protective coatings during wet etching: Application of the TALON WrapTM process," Proceedings of SPIE, vol. 6462, 2007, pp. 64620B-1 - 64620B-7.


Douglas J. Guerrero, Joyce Lowes, and Ramil Mercado, "Organic monolayer determination on semiconductor substrates," Journal of Photopolymer Science and Technology, vol. 20, no. 3, 2007, pp. 339-343.


Xuliang Han and Daniel C. Janzen, "Characterization of carbon nanotube thin films formed using electronic-grade carbon nanotube aqueous solutions," Proceedings of SPIE, vol. 6838, 2007, pp. 683811-1 - 683811-5.


Xuliang Han, Daniel C. Janzen, Jarrod Vaillancourt, and Xuejun Lu, "Printable high-speed thin-film transistor on flexible substrate using carbon nanotube solution," Micro & Nano Letters, vol. 2, no. 4, 2007, pp. 96-98.


Wenbin Hong, Rama Puligadda, Alex Smith, Dongshun Bai, Stefan Pargfrieder, Chad Brubaker, and Sarah Pfeiffer, "High-temperature adhesives for temporary wafer bonding using a sliding approach," IMAPS 2007: Proceedings of the International Microelectronics and Packaging Society 40th International Symposium on Microelectronics, November 11-15, 2007, pp. 1035-1040.


Runhui Huang, Dan Sullivan, Anwei Qin, and Shannon Brown, "Advanced developer-soluble gap-fill materials and applications," Proceedings of SPIE, vol. 6519, 2007, pp. 65192T-1 - 65192T-8.


Joseph L. Lenhart, Daniel Fischer, Sharadha Sambasivan, Eric K. Lin, Wen-Li Wu, Douglas J. Guerrero, Yubao Wang, and Rama Puligadda, "Understanding deviations in lithographic patterns near interfaces: Characterization of bottom anti-reflective coatings (BARC) and the BARC-resist interface," Applied Surface Science, vol. 253, no. 9, 2007, pp. 4166-4175.


Ramil-Marcelo L. Mercado, Joyce A. Lowes, Carlton A. Washburn, and Douglas J. Guerrero, "A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography," Proceedings of SPIE, vol. 6519, 2007, pp. 65192X-1 - 65192X-10.


Charles J. Neef and Deborah Thomas, "A new wet-developable BARC for 248-nm applications," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 709-714.


Charles J. Neef and Deborah Thomas, "A novel 248-nm wet-developable BARC for trench applications," Proceedings of SPIE, vol. 6519, 2007, pp. 65192Z-1 - 65192Z-8.


Menxing Ouyang, Mandy L.Y. Sin, Gary C.T. Chow, Wen J. Li, Xuliang Han, and Daniel C. Janzen, "DEP-Based Fabrication and Characterization of Electronic-Grade CNTs for Nano-Sensing Applications," Proceedings of the 7th IEEE International Conference on Nanotechnology, August 2-5, 2007, pp. .


Stefan Pargfrieder, Paul Kettner, Markus Wimplinger, and Rama Puligadda, "Ultrathin-wafer processing utilizing temporary bonding and debonding technology," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 878-888.


Rama Puligadda, Sunil Pillalamarri, Wenbin Hong, Chad Brubaker, Markus Wimplinger, and Stefan Pargfrieder, "High-performance temporary adhesives for wafer bonding applications," Materials Research Society Symposium Proceedings, vol. 970, 2007, pp. .


Yanli Qu, Mengxing Ouyang, Wen J. Li, and Xuliang Han, "CNTs as ultra-low-powered aqueous flow sensors in PDMS microfluidic systems," Proceedings of the 1st IEEE Conference on Nano/Molecular Medicine and Engineering (IEEE-NANOMED), August 6-9, 2007, pp. .


J.J. Senkevich, B.W. Woods, J.J. McMahon, and P.-I. Wang, "Thermomechanical properties of Parylene X, a room-temperature chemical vapor depositable crosslinkable polymer," Chemical Vapor Deposition, vol. 13, no. 1, 2007, pp. 55-59.


Wu-Sheng Shih, Jiro Yota, and Ketan Itchhaporia, "CON-TACT® planarization process of spin-on dielectrics for device fabrication," ECS Transactions, vol. 6, no. 3, 2007, pp. 501-522.


Wu-Sheng Shih, Jiro Yota, Hao Ly, Ketan Itchhaporia, and Alex Smith, "Planarization process for transparent polyimide coatings to reduce topography and overburden variation," Technical Digest, May 14-17, 2007, pp. 195-198.


A. Smith, R. Puligadda, W. Hong, T. Matthias, C. Brubaker, M. Wimplinger, and S. Pargfrieder, "High temperature–resistant spin-on adhesive for temporary wafer mounting using an automated high-throughput tooling solution," Technical Digest, May 14-17, 2007, pp. 29-32.


Daniel M. Sullivan, Runhui Huang, Shannon Brown, and Anwei Qin, "New developer-soluble gap-fill material," ISTC2007, Proceedings of the 6th International Conference on Semiconductor Technology, 2007, pp. 61-70.


Ramachandran K. Trichur and Xie Shao, "A photosensitive, spin-applied masking material for through-silicon via formation for wafer-level packaging," International Wafer-Level Packaging Conference (IWLPC) Proceedings, September 17-19, no. 09, 2007, pp. .


Stephen Turner, "Rework/stripping of multilayer materials for FEOL and BEOL integration using single wafer tool techniques," Proceedings of SPIE, vol. 6519, 2007, pp. 65192Q-1 - 65192Q-9.


Marc Weimer, Yubao Wang, Charles J. Neef, James Claypool, Kevin Edwards, and Zhimin Zhu, "Materials for and performance of multilayer lithographic schemes," Proceedings of SPIE, vol. 6519, 2007, pp. 65192S-1 - 65192S-8.

2006


Nickolas L. Brakensiek, Gary Martin, Sean Simmons, and Traci Batchelder, "Reducing bottom anti-reflective coating (BARC) defects: Optimizing and decoupling the filtration and dispense process," Proceedings of SPIE, vol. 6153, 2006, pp. 874-880.


Gary J. Brand and Ramachandran K. Trichur, "A method for edge protection of wafers during wet etching by application of TALON™ wrap process," Commercialization of Micro and Nano Systems Conference (COMS) 2006, August 27-31, 2006, pp. unnumbered.


Chris Cox, Curtis Planje, Nick Brakensiek, Zhimin Zhu, and Jonathan Mayo, "Microlens formation using heavily dyed photoresist in a single step," Proceedings of SPIE, vol. 6153, 2006, pp. 1378-1384.


Jyoti Dalvi-Malhotra, "Environmentally friendly i-line anti-reflective coating with reduced formaldehyde content," Polymeric Materials: Science and Engineering, vol. 95, 2006, pp. 1113-1114.


Joe Graber, Ryan Buschjost, Mary Ann Hockey, and Ed Brandenburg, "Enhancing the performance of conformal i-line bottom anti-reflective coating products," ISTC2006, Proceedings of the 5th International Conference on Semiconductor Technology, 2006, pp. 644-654.


Douglas J. Guerrero, Ramil Mercado, Carlton Washburn, and Jim Meador, "Photochemical studies on bottom anti-reflective coatings," Journal of Photopolymer Science and Technology, vol. 19, no. 3, 2006, pp. 343-347.


Douglas J. Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, and Tomoyuki Enomoto, "Two-layer anti-reflection strategies for implant applications," Proceedings of SPIE, vol. 6153, 2006, pp. 242-249.


Xuliang Han, "Characterization of carbonaceous impurity level in as-produced single-walled carbon nanotubes by using solution-phase spectrophotometry," IEEE-Nano 2006, July 17-20, 2006, pp. 636-639.


Xuliang Han, "Evaluation of carbonaceous impurities in as-produced single-walled carbon nanotubes by solution-phase spectrophotometry," Proceedings of the 1st IEEE International Conference on Nano-/Micro-Engineered and Molecular Systems (IEEE-NEMS 2006), January 18-21, 2006, pp. 1491-1493.


Xuliang Han, Daniel C. Janzen, Jarrod Vaillancourt, and Xuejun Lu, "A flexible thin-film transistor with high field-effect mobility by using carbon nanotubes," Proceedings of the IEEE Nanotechnology Materials and Devices Conference (IEEE-NMDC 2006), October 22-25, 2006, pp. 296-297.


Runhui Huang, "Study of iso/dense bias of BARCs and gap-fill materials on via wafers," Proceedings of SPIE, vol. 6153, 2006, pp. 829-836.


Jim Meador, Carol Beaman, Joyce Lowes, Carlton Washburn, Ramil Mercado, Mariya Nagatkina, and Charlyn Stroud, "Development of 193-nm wet BARCs for implant applications," Proceedings of SPIE, vol. 6153, 2006, pp. 854-863.


C.J. Mitchell, G.-R. Yang, and J.J. Senkevich, "Adhesion aspects of poly(p-xylylene) to SiO2 surfaces using γ-methacryloxypropyltrimethoxysilane as an adhesion promoter," Journal of Adhesion Science and Technology, October vol. 20, no. 14, 2006, pp. 1637-1647.


Robert Morford, Wu-Sheng Shih, and JoElle Dachsteiner, "Press-patterned UV-curable high refractive index coatings," Proceedings of SPIE, vol. 6123, 2006, pp. 1-11.


S. Pillalamarri, R. Puligadda, C. Brubaker, M. Wimplinger, and S. Pargfrieder, "High-temperature spin-on adhesives for temporary wafer bonding," IMAPS 2006: Proceedings of the International Microelectronics and Packaging Society 39th International Symposium on Microelectronics, October 8-12, 2006, pp. 105-111.


Anwei Qin, Daniel M. Sullivan, and Runhui Huang, "New developer-soluble gap-fill material with fast plasma etch rate," Proceedings of SPIE, vol. 6153, 2006, pp. 881-888.


Jay J. Senkevich, Brad Carrow, and Pei-I Wang, "Thermal and dielectric stability of Parylene X," Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects: Materials Research Society Symposium Proceedings, vol. 914, 2006, pp. 101-106.


J.J. Senkevich, B.W. Woods, B.P. Carrow, R.D. Geil, and B.R. Rogers, "Amorphous highly conjugated chemical-vapor-deposited polymer thin films," Chemical Vapor Deposition, vol. 12, no. 5, 2006, pp. 285-289.


A. Smith, J. Moore, and B. Hosse, "A chemical and thermal resistant wafer bonding adhesive simplifying wafer backside processing," CS MANTECH: 2006 International Conference on Compound Semiconductor Manufacturing Technology Digest of Papers, April 24-27, 2006, pp. 269-271.


J. Vaillancourt, X. Lu, X. Han, and D.C. Janzen, "High-speed thin-film transistor on flexible substrate fabricated at room temperature," Electronics Letters, November 9, vol. 42, no. 23, 2006, pp. 1365-1366.


Carlton Washburn, Nick Brakensiek, Alice Guerrero, Kevin Edwards, Charlyn Stroud, and Nicki Chapman, "Wet-recess process optimization of a developer-soluble gap-fill material for planarization of trenches in trench-first dual damascene process," Proceedings of SPIE, vol. 6153, 2006, pp. 815-820.


Carlton Washburn, Alice Guerrero, Ramil Mercado, Douglas Guerrero, and Jim Meador, "Process development for developer-soluble bottom anti-reflective coatings (BARCs)," INTERFACE 2006: Proceedings of the 43rd Microlithography Symposium, October 29-31, 2006, pp. .


Carlton Washburn, Ramil Mercado, Douglas Guerrero, and Jim Meador, "Controlling CD and process window limits for implant patterning," Solid State Technology, October vol. 49, no. 10, 2006, pp. 53-56.


Xiang-Long Xing, Ji-Wei Jiao, Mark Daffron, Yue-Lin Wang, and Hyung Choi, "Contact planarization of sacrificial photoresist for MEMS application," Journal of Functional Materials and Devices, April vol. 12, no. 2, 2006, pp. 135-138, 154.


Gu Xu, Rakesh R. Nambiar, and Frank D. Blum, "Room-temperature decomposition of 2,2'-azobis(isobutyronitrile) in emulsion gels with and without silica," Journal of Colloid and Interface Science, vol. 302, no. 2, 2006, pp. 658-661.

2005


Nickolas L. Brakensiek, Peng Zhang, Danielle King, and Craig Ghelli, "Advanced rinse process alternatives for reduction of photolithography development cycle defects," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 241-251.


Nickolas L. Brakensiek and Ryan Long, "Throughput increase by adjustment of the BARC drying time with coat track process," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 1102-1107.


B.P. Carrow, R.E. Murray, B.W. Woods, and J.J. Senkevich, "Poly(ethynyl-p-xylylene), an advanced molecular caulk CVD polymer," Materials Research Society Symposium Proceedings, vol. 863, 2005, pp. 189-194.


James B. Claypool, Marc Weimer, Vandana Krishnamurthy, Wendy Gehoel, and Koen van Ingen Schenau, "New advanced BARC materials for ultra-high NA applications," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 679-689.


M. Daffron, W.-S. Shih, and K. Marler, "CON-TACT® brand planarization and ENSEMBLE* CP dielectric coating: Smoothing out the bumps on the road to 90nm technology and beyond," Proceedings of the 4th International Conference on Semiconductor Technology (ISTC 2005), 2005, pp. 620-629.


Alice F. Guerrero and Mary Ann Hockey, "Process optimization solutions with organic BARC," COMS: 10th International Commercialization of Micro and Nano Systems Conference, August 21-25, 2005, pp. 261-266.


Runhui Huang, Heping Wang, and Anwei Qin, "A new method to characterize conformality of BARC coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 627-635.


Runhui Huang, Carlton Washburn, Anwei Qin, Kevin Edwards, and Charles J. Neef, "Development and process of low dense/iso bias dual damascene materials," Semiconductor Technology: Proceedings of the 4th International Conference on Semiconductor Technology (ISTC 2005, Shanghai, China), March 15-17, 2005, pp. 138-148.


Ramil Mercado, Rebecca Rich, Wu-Sheng Shih, Udayan Senapati, and Doug Holmes, "Press-patterned diffraction gratings on high refractive index polyimide films," Proceedings of SPIE: Integrated Optics: Devices, Materials, and Technologies IX, vol. 5728, 2005, pp. 227-236.


Robert Morford, Doug Holmes, Curt Planje, Gary Brand, Zhimin Zhu, and Aaron Jacobs, "High refractive index polymer coatings," Proceedings of the 14th International Conference on Polymer Optical Fiber, 2005, pp. 65-69.


R.V. Morford, R.L. Mercado, C.E. Planje, and T.D. Flaim, "High refractive index photocurable resins," Proceedings of SPIE: Organic Photonic Materials and Devices VII, vol. 5724, 2005, pp. 34-41.


Earnest Murphy, "Customer process inquiry forms work," Quality Digest, August vol. 25, no. 8, 2005, pp. 56.


Willie Perez, Stephen Turner, Nick Brakensiek, Lynne Mills, Larry Wilson, and Paul Popa, "Hybrid BARC approaches for FEOL and BEOL integration," Proceedings of SPIE: Advances in Resist Technology and Processing XXII, vol. 5753, 2005, pp. 436-448.


Stephen Turner and Lynne Mills, "Applications of spin-on hybrid BARCs for FEOL and BEOL integration," Solid State Technology, June vol. 48, no. 6, 2005, pp. 75-78.


Andy Waite-Wright, "Industry roadmaps must enable rebirth of innovation," WaferNEWS, July 2005, pp. 17-18.


Yubao Wang, Tony Flaim, Ramil Mercado, Shelly Fowler, Doug Holmes, and Curtis Planje, "Hybrid high refractive index polymer coatings," Proceedings of SPIE: Organic Photonic Materials and Devices VII, vol. 5724, 2005, pp. 42-49.


Carlton Washburn, "Reducing 300 mm wafer coating defects without compromising uniformity," Semiconductor Manufacturing, May 2005, pp. 34-35.


Carlton Washburn, Darron Dippel, and Kevin Edwards, "CD uniformity and bias improvement in the via-first dual damascene process using a developer-soluble gap-fill material," INTERFACE 2005: Proceedings of the 42nd Microlithography Symposium, October 23-25, 2005, pp. 27-1 - 27-7.

2004


Mandar Bhave, Kevin Edwards, Carlton Washburn, Satoshi Takei, Yasushi Sakaida, and Yasuyuki Nakajima, "Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 640-647.


Nick Brakensiek, Kevin Edwards, Paul Williams, and Deng Jian Ping, "Advanced process considerations for BARC and gap fill technology in via-first Dual Damascene integration for sub 0.13-u technology," SEMICON China 2004 SEMI Technology Symposium, March 17-19, 2004, pp. .


Nickolas L. Brakensiek, Brian Kidd, Carlton Washburn, and Earnie Murphy, "Wet-Recess Process Optimization of a Bottom Antireflective Coating for the Via-First Dual Damascene Scheme," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 633-639.


Mark Daffron, Wu-Sheng Shih, and Rebecca Rich, "The Use of Modified Processes to Reduce Feature Density Effects Observed During Contact Planarization Processes," Proceedings of the Ninth International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC), 2004, pp. 377-384.


Mark Daffron, Wu-Sheng Shih, Rebecca Rich, JoElle Dachsteiner, and Julie Snook, "The use of CON-TACT(R) brand planarization to improve planarity for shallow trench isolation (STI) applications," SEMICON West 2004, SEMI Technology Symposium: Innovations in Semiconductor Manufacturing, July 14, 2004, pp. 85-92.


Madison Daily, Kim Ruben, Tony Flaim, and Chenghong Li, "ProTEKTM: A KOH protective coating for MEMS bulk micromachining," Commercialization of Micro and Nano Systems (COMS) Conference Proceedings, 2004, pp. 109-113.


Isabelle Guilmeau, Alice Guerrero, Vincent Blain, Stephanie Kremer, Vincent Vachellerie, Damien Lenoble, Patricia Nogueira, Sebastien Mougel, and Jean-Damien Chapon, "Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 461-470.


Liu He, Rama Puligadda, Joyce Lowes, and Michael Rich, "Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 648-654.


Runhui Huang, "Via-fill properties of organic BARCs in dual damascene application," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 711-717.


Runhui Huang, Marc Weimer, and Mariya Nagatkina, "A 193-nm Bottom Anti-Reflective Coating with Broad Photoresist Compatibility," INTERFACE 2004: Proceedings of the ARCH Chemicals Microlithography Symposium, September 26-28, 2004, pp. unnumbered.


Yoko Kishi, Katsu Kawabata, Haiying Shi, and Robert Thomas, "Reduction of Carbon-Based Interferences in Organic Compound Analysis by Dynamic Reaction Cell ICP MS," Spectroscopy, September vol. 19, no. 9, 2004, pp. 14-23.


Jim D. Meador, Doug Holmes, Mariya Nagatkina, Rama Puligadda, Denise Gum, Randy Bennett, Sam Sun, and Tomoyuki Enomoto, "New Materials for 193-nm Trilayer Imaging," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 1138-1148.


Ramil Mercado, Yubao Wang, Tony Flaim, William DiMenna, and Udayan Senapati, "Thin-film polyetherimides with controlled refractive indices," Proceedings of SPIE: Organic Photonic Materials and Devices VI, vol. 5351, 2004, pp. 276-283.


Charles J. Neef, Vandana Krishnamurthy, Mariya Nagatkina, Evan Bryant, Michelle Windsor, and Cheryl Nesbit, "New BARC Materials for the 65-nm Node in 193-nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 684-688.


Kimberly Ruben, Tony Flaim, and Chenghong Li, "Polymeric Protective Coatings for MEMS Wet-Etch Processes," Proceedings of SPIE: Micromachining and Microfabrication Process Technology IX, vol. 5342, 2004, pp. 212-220.


Xie Shao, Alice Guerrero, and Yiming Gu, "Taking the wet-developable route to applying BARC in implant layers," Solid State Technology, June vol. 47, no. 6, 2004, pp. 61-64.


Xie Shao, Alice Guerrero, and Yiming Gu, "Wet-Developable Organic Anti-Reflective Coatings for Implant Layer Applications," SEMICON China 2004 SEMI Technology Symposium, March 17-19, 2004, pp. .


Wu-Sheng Shih, Charles J. Neef, and Mark G. Daffron, "A Planarization Process for Multi-Layer Lithography Applications," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 2004, pp. 664-672.


Y.Q. Wang, M. Curry, E. Tavenner, N. Dobson, and R.E. Giedd, "Ion beam modification and analysis of metal/polymer bi-layer thin films," Nuclear Instruments and Methods in Physics Research B, vol. 219-220, 2004, pp. 798-803.

2003


Nickolas L. Brakensiek, Brian Kidd, Michael Mesawich, Don Stevens, Jr., and Barry Gotlinsky, "Spin-on Bottom Antireflective Coating Defect Reduction by Proper Filter Selection and Process Optimization," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 858-861.


Nickolas L. Brakensiek, Carlton A. Washburn, and Earnest Murphy, "Novel BARC Etchback Process for Via-First Dual Damascene Processes," INTERFACE 2003: Proceedings of the ARCH Chemicals Microlithography Symposium, September 22-23, 2003, pp. unnumbered.


Chris Cox, Darron Dippel, Craig Ghelli, Pat Valerio, Bill Simmons, and Alice Guerrero, "Developer Soluble Organic BARCs for KrF Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 878-882.


Chelladurai Devadoss, Yubao Wang, Rama Puligadda, Joseph L. Lenhart, Erin L. Jablonski, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, and Wen-Li Wu, "Investigation of BARC-Resist Interfacial Interactions," Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, 2003, pp. 912-922.


Tony Flaim, Yubao Wang, and Ramil Mercado, "High Refractive Index Polymer Coatings for Optoelectronics Applications," Proceedings of SPIE: Optical Systems Design 2003, vol. 5250, 2003, pp. 423-434.


Douglas J. Guerrero, Bill DiMenna, Tony Flaim, Ramil Mercado, and Sam Sun, "Dyed red, green, and blue photoresist for manufacture of high resolution color filter arrays for image sensors," Proceedings of SPIE: Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications IV, vol. 5017, 2003, pp. 298-306.


Douglas J. Guerrero and Tonya Trudgeon, "A New Generation of Bottom Anti-Reflective Coatings (BARCs): Photodefinable BARCs," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 129-135.


Liu He, Rama Puligadda, Joyce Lowes, and Michael Rich, "Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography," Proceedings of SPIE: Optical Microlithography XVI, vol. 5040, 2003, pp. 1386-1395.


Erin L. Jablonski, Sharadha Sambasivan, Eric K. Lin, Daniel A. Fischer, Chelladurai Devadoss, and Rama Puligadda, "Near edge x-ray absorption fine structure measurements of the interface between bottom antireflective coatings and a model deprotected photoresist," Journal of Vacuum Science and Technology B, November-December vol. 21, no. 6, 2003, pp. 3153-3156.


Vandana Krishnamurthy, Charles J. Neef, and Stephen R. Turner, "Novel Spin Bowl Compatible, Wet Developable Bottom Anti-Reflective Coating for i-Line Applications," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 883-890.


James E. Lamb III, Mark Daffron, Russell Hopper, Marci Whittaker, and Sharon Scott, "Planarizing difficult topographies using contact planarization," Solid State Technology, October vol. 46, no. 10, 2003, pp. .


Jeremy W. McCutcheon, "Research on a novel planarization method as an alternative or complement to CMP," Proceedings of the Eighth International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC), 2003, pp. 283-290.


Jim D. Meador, Doug Holmes, William L. DiMenna, Mariya Nagatkina, Michael Rich, Tony Flaim, Randy Bennett, and Ichiro Kobayashi, "193-nm Multilayer Imaging Systems," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 948-959.


Charles Neef, Michelle Fowler, Michelle Windsor, and Cheryl Nesbit, "New Materials for 193-nm BARC Application," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 872-877.


Kelly A. Nowak, "Void Elimination Research in Bottom Anti-Reflective Coatings for Dual Damascene Photolithography," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 891-901.


Wu-Sheng Shih and Mark G. Daffron, "A Novel Planarization Process for Providing Global Planarity for IC Manufacturing," Proceedings of the 2003 International Symposium on Microelectronics, November 18-20, 2003, pp. 813-818.


Mary Spencer, Kim Ruben, Chenghong Li, Paul Williams, and Tony Flaim, "Polymer protective coating for wet deep silicon etching processes," Proceedings of SPIE: Micromachining and Microfabrication Process Technology VIII, vol. 4979, 2003, pp. 79-86.


Heping Wang, Terry Toddy, Stephen Gibbons, and Trisha May, "Development of a Polymer Etch Rate Monitor: Design, Characterization, and Application," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XVII, vol. 5038, 2003, pp. 1012-1018.


Marc Weimer, Vandana Krishnamurthy, Shelly Fowler, Cheryl Nesbit, and James Claypool, "New Material for 193-nm Bottom Anti-Reflective Coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XX, vol. 5039, 2003, pp. 866-871.


Paul Williams and Xie Shao, "Process Considerations for Organic Bottom Anti-Reflective Coating [BARC] Optimization for Front-End and Back-End-Of-Line Integration," SEMICON China 2003 SEMI Technology Symposium, March 12-14, 2003, pp. 229-238.

2002


Mandar Bhave, Jim Meador, James Claypool, Jill Akers, and Anne Lindgren, "Thin Organic Bottom Antireflective Coatings for 193nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1074-1084.


Nickolas L. Brakensiek, "Bottom Anti-Reflective Coating Processing Techniques for Via-First Dual Damascene Processes," Proceedings of SPIE: Optical Microlithography XV, vol. 4691, 2002, pp. 927-936.


Nickolas L. Brakensiek, Chris Cox, and Rama Puligadda, "Processing Techniques for Novel BARC Chemistries," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1043-1051.


James Claypool, Rama Puligadda, Jill Akers, Rikimaru Sakamoto, and Ken-ichi Mizusawa, "Design Considerations for Bottom Antireflective Coating for 157nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIX, vol. 4690, 2002, pp. 1065-1073.


Douglas J. Guerrero and Tony D. Flaim, "Photosensitive Titania Polymers," Journal of Photopolymer Science and Technology, vol. 15, no. 3, 2002, pp. 447-451.


James E. Lamb III, "Research on a Novel Planarization Method as an Alternative to CMP," SEMI Technical Symposium (STS): Innovations in Semiconductor Manufacturing (SEMICON West 2002), 2002, pp. 171-173.


Charles J. Neef, Vandana Krishnamurthy, and Stephen R. Turner, "Novel spin bowl compatible, wet developable bottom anti-reflective coating for i-line applications," Polymeric Materials: Science and Engineering, vol. 87, 2002, pp. 199-200.


Kelly A. Nowak, Trisha May, Jacquelynn Backus, Brian Davis, John Thompson, and Denise Howard, "Void elimination research in bottom anti-reflective coatings for dual damascene photolithography," INTERFACE 2002: Proceedings of the Arch Chemicals/FUJIFILM Arch Microlithography Symposium, September 22-24, 2002, pp. unnumbered.


Ram W. Sabnis, Mary J. Spencer, and Douglas J. Guerrero, "Novel organic, polymeric materials for electronics applications," Materials Research Society Symposium Proceedings, Spring vol. 722, 2002, pp. K9.16.1-K9.16.6.


Paul Williams, Xie Shao, and Keith Strassner, "Fundamentals in Bottom Anti-Reflective Coating Design for its Successful Integration into i-Line and DUV Manufacturing," SEMICON China 2002 SEMI Technical Symposium, March 26-27, 2002, pp. T-1 - T-5.


Gu Xu, Jonathan Mayo, Curtis Planje, Lorie Rieken, and Gary Brand, "High Resolution Dyed Color Filter Material for Use in Digital Photography Applications - Cyan, Magenta, and Yellow Color Photoresists," Proceedings of SPIE: Sensors and Camera Systems for Scientific, Industrial, and Digital Photography Applications III, vol. 4669, 2002, pp. 377-383.

2001


Shreeram Deshpande, Nick Brakensiek, Paul Williams, Kelly Nowak, and Shelly Fowler, "Sub 0.35¨µm i-Line Lithography with New Advanced Bottom Anti-Reflective Coatings Optimized for High Topography and Dual Damascene Applications," Proceedings of SPIE: Lithography for Semiconductor Manufacturing II, vol. 4404, 2001, pp. 354-367.


Shreeram Deshpande, Kelly Nowak, Shelly Fowler, Paul Williams, and Manuel Arjona, "Novel Conformal Organic Anti-Reflective Coatings for Advanced i-Line Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 855-863.


R. Fang, H. Gu, M.J. O'Keefe, T.J. O'Keefe, W.-S. Shih, K.D. Leedy, and R. Cortez, "Spontaneous, non-aqueous electrochemical deposition of copper and palladium on Al and Al(Cu) thin films," Journal of Electronic Materials, vol. 30, no. 4, 2001, pp. 349-354.


Runhui Huang and Ryan Giedd, "Electrical Characterization of an Ion Beam Mixed Metal/Polymer System," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XV, vol. 4344, 2001, pp. 583-588.


Jim D. Meador, Xie Shao, Mandar Bhave, Chris Cox, John Thompson, Deborah Thomas, Stephen Gibbons, Ashley Farnsworth, and Michael Rich, "Improved Crosslinkable Polymeric Binders for 193-nm Bottom Antireflective Coatings (BARCs)," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 846-854.


Rama Puligadda, Runhui Huang, Chris Cox, James E. Lamb III, Manuel Arjona, and James Claypool, "New Fast Etching Bottom Antireflective Coatings for 248nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 829-837.


Ram W. Sabnis, Mario Cazeca, William L. DiMenna, Mary J. Spencer, Douglas J. Guerrero, and Min-Shyan Sheu, "Organic polymeric coatings deposited by plasma enhanced chemical vapor deposition," Journal of Vacuum Science and Technology, November-December vol. 19, no. 6, 2001, pp. 2184-2189.


Xie Shao, Jim Meador, Shree Deshpande, Rama Puligadda, Kenichi Mizusawa, and Shinya Arase, "Recent Progress in Organic Bottom Anti-reflective Coatings," Journal of Photopolymer Science and Technology, vol. 14, no. 3, 2001, pp. 481-488.


Yubao Wang, Xiaoming Wu, Gu Xu, Jim Lamb III, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, and Hiroyoshi Fukuro, "Development of Full-Fill Bottom Anti-Reflective Coatings for Dual Damascene Process," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 838-845.


Paul Williams, Xie Shao, and Keith Strassner, "The Contributions of Organic Anti-reflective Coatings in Modern Optical Lithography," SEMICON China 2001 SEMI Technical Symposium, March 28-29, 2001, pp. G-1 - G-7.


Gu Xu, Tim Limmer, Jo Mayo, Tom Evers, and John Berges, "Novel Photo Sensitive Pigmented Color Filter Materials," SEMICON China 2001 SEMI Technical Symposium, March 28-29, 2001, pp. FF-1 - FF-5.


Tianyue Yu, Philip Ching, Christopher Ober, Shreeram Deshpande, and Rama Puligadda, "Development of a Bond Contribution Model for Structure: Property Correlations in Dry Etch Studies," Proceedings of SPIE: Advances in Resist Technology and Processing XVIII, vol. 4345, 2001, pp. 945-951.

2000


George E. Bailey, Nicholas K. Eib, and Earnest C. Murphy, "Progressions in deep ultraviolet bottom antireflective coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XVII, vol. 3999, 2000, pp. 935-948.


Shreeram Deshpande, Xie Shao, James Lamb III, Nick Brakensiek, Joe Johnson, Xiaoming Wu, Gu Xu, and Bill Simmons, "Advancements in Organic Anti-Reflective Coatings for Dual Damascene Processes," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XIV, vol. 3998, 2000, pp. 797-805.


R. Fang, H. Gu, T.J. O'Keefe, M.J. O'Keefe, W.-S. Shih, K.D. Leedy, and R. Cortez, "An alternative metallic seeding technique for subsequent electrochemical deposition of copper onto barrier metals," Advanced Metallization Conference 2000 (AMC 2000), October 2-5, 2000, pp. 137-143.


Jim D. Meador, Xie Shao, Vandana Krishnamurthy, Manuel Arjona, Mandar Bhave, Gu Xu, James Claypool, and Anne Lindgren, "Second-Generation 193-nm Bottom Antireflective Coatings (BARCs)," Proceedings of SPIE: Advances in Resist Technology and Processing XVII, vol. 3999, 2000, pp. 1009-1018.


Benedicte Mortini, Severine Gally, Patrick J. Paniez, Samir Derrough, and Xie Shao, "Investigation of 193 nm resist/organic BARC compatibility and optimization of BARC process conditions," INTERFACE 2000: Proceedings of the ARCH Microlithography Symposium, November 5-7, 2000, pp. 163-173.


W.-S. Shih, J.A.M. Snook, D.J. Guerrero, and M.J. O'Keefe, "Selective deposition of metals for integrated circuits packaging applications," IMAPS International Advanced Technology Workshop on Flip Chip Technology, March 3-5, 2000, pp. unnumbered.


Paul Williams, Alice Martin, Marlene Stroble, Bill Roberts, Frank Goodwin, Lars Vslkel, Axel Fiecke, Sean Trautman, and Jim Lamb III, "Optimization of the planarizing performance of a DUV organic bottom anti-reflective coating for via first dual damascene process: Cooperation to achieve material and process characterization," Proceedings of SPIE: Microlithographic Techniques in Integrated Circuit Fabrication II, vol. 4226, 2000, pp. 160-168.

1999


Hubert Enichlmair, Oliver Stelmaszyk, and Paul Williams, "Optimization of a wet-patterning bottom antireflective i-line coating for both poly gate and metal lithography processes," Proceedings of SPIE: Microelectronic Device Technology III, vol. 3881, 1999, pp. 265-273.


H. Gu, T.J. O'Keefe, M.J. O'Keefe, K.D. Leedy, R. Cortez, R.E. Strawser, and W.-S. Shih, "Spontaneous electrochemical deposition of metals from organic solutions," Electrochemical Society Proceedings: Fundamentals of Electrochemical Deposition and Dissolution, vol. 99-33, 1999, pp. 242-251.


Jim D. Meador, Douglas J. Guerrero, Gu Xu, Xie Shao, Norm Dobson, James Claypool, and Kelly Nowak, "Recent Progress in 193 nm Antireflective Coatings," Proceedings of SPIE: Advances in Resist Technology and Processing XVI, vol. 3678, 1999, pp. 800-809.


Ram W. Sabnis, "Color filter technology for liquid crystal displays," Displays, November vol. 20, no. 3, 1999, pp. 119-129.


R.W. Sabnis, D.W. Rangnekar, and N.D. Sonawane, "2-Aminothiophenes by the Gewald Reaction," Journal of Heterocyclic Chemistry, March-April vol. 36, 1999, pp. 333-345.


Xie Shao, Jim E. Lamb III, James Claypool, Bill Simmons, and Earnie Murphy, "Broadband planarizing anti-reflective coating for i-line, DUV and 193nm microlithographic applications," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XIII, vol. 3677, 1999, pp. 884-894.


Bill Simmons, Joe Johnson, Xie Shao, Shree Desphande, James Lamb III, Paul Williams, and Sharon Scott, "Organic Anti-Reflective Coatings for Dual Damascene Applications," INTERFACE '99: Proceedings of the ARCH Microlithography Seminar, 1999, pp. 183-195.

1998


M. Fang, T. O'Keefe, M. Stroder, W.-S. Shih, M. O'Keefe, R. Strawser, and D. Via, "Maskless direct deposition of copper onto aluminum bond pads for flip chip applications," Materials Research Society Symposium Proceedings, vol. 515, 1998, pp. 85-90.


R.E. Giedd, M.G. Moss, J. Kaufmann, and Y.Q. Wang, "Electrical applications of ion-implanted polymer films," Electrical and Optical Polymer Systems: Fundamentals, Methods, and Applications, 1998, pp. 1011-1030.


Douglas J. Guerrero, Jim D. Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, and James E. Lamb III, "Deep Ultraviolet Antireflective Coating with Improved Conformality, Optical Density, and Etch Rate," Proceedings of SPIE: Advances in Resist Technology and Processing XV, vol. 3333, 1998, pp. 228-235.


Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Ilse van Puyenbroeck, Kurt Ronse, James E. Lamb III, and Johan B.C. van der Hilst, "Optimisation of bottom-ARC processes with respect to CD control," Future Fab International, vol. 5, 1998, pp. 205-210.


Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James E. Lamb III, Johan B.C. van der Hilst, and Johannes van Wingerden, "Bottom-ARC optimization methodology for 0.25 um lithography and beyond," Proceedings of SPIE: Optical Microlithography XI, vol. 3334, 1998, pp. 322-336.


R.W. Sabnis, J.W. Mayo, M.D. Stroder, K. Aoba, K. Ema, Y. Sone, T. Nihira, and A. Yanagimoto, "A novel, photosensitive ultrathin black matrix system," Asia Display '98, 1998, pp. 1025-1028.


R.W. Sabnis, M.D. Stroder, R.E. Nichols, E.G. Hays, A. Yanagimoto, Y. Sone, Y. Watanabe, and K. Ema, "High-Optical-Density Ultra-Thin Black-Matrix System," Society for Information Display '98 Symposium Digest, vol. 29, 1998, pp. 548-551.


Heping Wang and Patricia M. Callahan, "Adsorption studies of azo dyes as resonance Raman spectroscopic probes at solid-liquid interfaces," Journal of Chromatography A, December vol. 828, 1998, pp. 121-134.


Paul Williams, Xie Shao, Jim Lamb, Colin Hester, and Tony Flaim, "Fast Etch Anti-Reflective Coating for Sub-0.35μm i-Line Microlithography Applications," Proceedings of SPIE: Metrology, Inspection, and Process Control for Microlithography XII, vol. 3332, 1998, pp. 518-525.


Gu Xu, Douglas J. Guerrero, and Norman J. Dobson, "New Antireflective Coatings for 193 nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XV, vol. 3333, 1998, pp. 524-531.

1997


Tony D. Flaim and Xie Shao, "Design and Performance of Polymeric Anti-Reflective Coatings for Advanced i-Line Photoresist Processes," Proceedings, 11th International Conference, Photopolymers: Principles, Processes, and Materials, October 6-8, 1997, pp. 323-338.


R.E. Giedd, M.G. Moss, J. Kaufmann, and Y.Q. Wang, "Ion beam modification of polymers," Application of Accelerators in Research and Industry, AIP Conference Proceedings, vol. 392, 1997, pp. 993-996.


Mariya Nagatkina, Paul Williams, Jim E. Lamb III, Joseph A. Raposo, Gunter Elmendorff, and Frank Dohmen, "Organic i-line antireflective coating for sub-half micron wet and dry patterning," INTERFACE '97: Proceedings of the Olin Microlithography Seminar, November 9-11, 1997, pp. 101-117.


Y.Q. Wang, R.E. Giedd, M.G. Moss, and J. Kaufmann, "Electronic properties of ion-implanted polymer films," Nuclear Instruments and Methods in Physics Research B, vol. 127-128, 1997, pp. 710-715.


Y.Q. Wang, R.E. Giedd, M.G. Moss, and J. Kaufmann, "Inhomogeneous Characterstic of Ion-Implanted Polymers within the Implanted Layer," Application of Accelerators in Research and Industry, 1997, pp. 985-988.

1996


Chang-Ming Dai, Chin-Lung Lin, Shi-Chang Tai, James E. Lamb III, and M. Iida, "Post Exposure Baking Temperature Effect on Resist Profile with Bottom Anti-reflective Coating," Proceedings of SPIE: Optical Microlithography IX, vol. 2726, 1996, pp. 598-607.


Ryan E. Giedd, Y.Q. Wang, Mary G. Moss, and James Kaufmann, "Versatile applications of ion implanted polymers," Materials Research Society Symposium Proceedings, vol. 396, 1996, pp. 305-310.


James Kaufmann, Mary G. Moss, Yongqiang Wang, and Ryan E. Giedd, "Conductive Polymer Films for Microbolometer Applications," Proceedings of SPIE: Infrared Technology and Applications XXII, vol. 2744, 1996, pp. 334-344.


James Kaufmann, Mary G. Moss, Yongqiang Wang, and Ryan E. Giedd, "Suspended Conductive Polymer Bridges from Ion Implanted Polymers," Materials Research Society Symposium Proceedings, vol. 396, 1996, pp. 329-334.


Jonathan W. Mayo, Michael J. Pfeiffer, Michael D. Stroder, Alain Dunand, Stephane Vago, Benedicte Galea, Jim Sedon, Mark Newsham, Brian Martin, Don Perettie, and Ben DeKoven, "Colour Filters for Flat Panel Displays by High Definition Ink Jet Printing," Society for Information Display Euro '96 Proceedings, 1996, pp. 537-540.


Edward K. Pavelchek, Jim D. Meador, Douglas J. Guerrero, James E. Lamb III, Ajit Kache, Manuel doCanto, Timothy G. Adams, David Stark, and Danny Miller, "A Highly Absorbing ARC for DUV Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XIII, vol. 2724, 1996, pp. 692-699.


R.W. Sabnis, J.W. Mayo, M.D. Stroder, E.G. Hays, A. Yanagimoto, Y. Sone, Y. Watanabe, and K. Ema, "A Novel Black Matrix System," Proceedings of Sixteenth International Display Research Conference (IDRC), SID's 16th International Display Research Conference, Euro Display '96, 1996, pp. 240-243.


John Sturtevant, Linda Insalaco, Tony Flaim, Vanada Krishnamurthy, Jim Meador, John Peterson, and Andy Eckert, "Removable Organic Antireflection Coating," Proceedings of SPIE: Advances in Resist Technology and Processing XIII, vol. 2724, 1996, pp. 738-746.


Heping Wang, Gery Armaly, and L. Jeff Myron, "Mobile Phase Modification in Polyamic Acid Molecular Weight Measurement by Gel Permeation Chromatography," Proceedings of the International GPC Symposium '96, September 8-11, 1996, pp. 484-498.

1995


L. Insalaco, V. Krishnamurthy, John Sturtevant, and J. Mitchener, "UV Pretreatments for Improved Etching of Organic ARC Layer," Proceedings of SPIE: Advances in Resist Technology and Processing XII, vol. 2438, 1995, pp. 540-550.


James E. Lamb III, "Organic ARC Anti-Reflective Coating Application within the Microelectronics Industry," Semiconductor Fabtech, no. 2, 1995, pp. 223-227.


Jim Lamb, "Anti-reflective coatings," European Semiconductor, February 1995, pp. 13-15.


J.M. Mayo, M.J. Pfeiffer, and M.D. Stroder, "Optically Transparent Barrier Photoresist," Asia Display '95: Proceedings of the 15th International Display Research Conference, October 16-18, 1995, pp. 717-720.

1994


R.E. Giedd, D. Robey, Y.Q. Wang, M.G. Moss, and J. Kaufmann, "The electronic microstructure in the implant layer of ion implanted polymers," Materials Research Society Symposium Proceedings, vol. 316, 1994, pp. 75-80.


J. Hunninghake, M. Stroder, J. Mayo, G. Brand, and E. Hays, "A Systems Approach to Color Filters for Flat-Panel Displays," SID 94 Digest, 1994, pp. 407-410.


James Lamb, "A customer-supplier partnership resolves manufacturing and defect issues," Solid State Technology, vol. 37, no. 9, 1994, pp. 55.


R.A. Mayanovic, Y. Feng, K.W. Groh, Y. Wang, R.E. Giedd, and M.G. Moss, "Local Structure Surrounding Implanted As+ Ions in Polysulfone Films," Materials Research Society Symposium Proceedings, vol. 321, 1994, pp. 113-116.


Ardavan Niroomand and Elliott Capsuto, "Characterization of an advanced i-line bottom anti-reflecting coating for a 400mm process," INTERFACE '94: Proceedings of the OCG Microelectronic Materials Microlithography Seminar, 1994, pp. 183-195.


Y.Q. Wang, D.S. Robey, R.E. Giedd, and M.G. Moss, "Piezoresistivity in ion implanted polymer films," Materials Research Society Symposium Proceedings, vol. 316, 1994, pp. 349-354.

1993


Y.P. Feng, D.S. Robey, Y.Q. Wang, R.E. Giedd, and M.G. Moss, "Conductivity and stability in ion-implanted polyaniline," Materials Letters, vol. 17, no. 3-4, 1993, pp. 167-170.


James Lamb and Mary G. Moss, "Expanding Photolithography Process Latitude with Organic AR Coatings," Solid State Technology, September vol. 36, no. 9, 1993, pp. 79-83.


Joseph A. Raposo, Vijay P. Singh, John C. McClure, Raymond G. Bell, and Jonathan W. Mayo, "Current transport and aging in direct-current powder electroluminescent display devices," Journal of the Society for Information Display, vol. 1, no. 4, 1993, pp. 397-403.


V.P. Singh, J.A. Raposo, J.C. McClure, R.G. Bell, and J.W. Mayo, "A Study of Modified Structures for Reducing Aging Effects in DCPEL Display Devices," SID 93 Digest, 1993, pp. 859-862.

1992


Gregg A. Barnes, Tony D. Flaim, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters, and Stephen M. Bobbio, "Anti-Reflective Coating for Deep UV Lithography Process Enhancement," Polymer Engineering and Science, Mid-November vol. 32, no. 21, 1992, pp. 1578-1582.


Bruce W. Dudley, Susan K. Jones, Charles R. Peters, David A. Koester, Gregg A. Barnes, Tony D. Flaim, and James E. Lamb III, "Enhancement of Deep UV Patterning Integrity and Process Control Using Anti-Reflective Coating," Proceedings of SPIE: Advances in Resist Technology and Processing IX, vol. 1672, 1992, pp. 638-646.

1991


Gregg A. Barnes, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters, Stephen M. Bobbio, and Tony D. Flaim, "Anti-reflective coating for deep UV lithography process enhancement," Photopolymers: Principles - Processes and Materials, October 28-30, 1991, pp. 259-270.


Tony D. Flaim, Chung-Peng Ho, and Michael J. Pfeiffer, "All-trans polyamic esters as precursors to rigid rod polyimides," Advances in Polyimide Science and Technology, Proceedings of the Fourth International Conference on Polyimides, October 30-November 1, 1991, pp. 213-219.


Ryan E. Giedd, M.G. Moss, M.M. Craig, and D.E. Robertson, "Temperature sensitive ion-implanted polymer films," Nuclear Instruments and Methods in Physics Research [Netherlands], vol. B59/60, 1991, pp. 1253-1256.


S. Sethi, R. Distasio, D. Ziger, J. Lamb, and T. Flaim, "Use of anti-reflective coatings in deep UV lithography," Proceedings of SPIE: Optical/Laser Microlithography IV, vol. 1463, 1991, pp. 30-40.

1990


Yuh J. Uang, Tony D. Flaim, and Frank D. Blum, "W/O microemulsion studies with mono- and dialkyl amic acid surfactants," Journal of Colloid and Interface Science, October 15, vol. 139, no. 2, 1990, pp. 381-391.

1989


T.D. Flaim, G.A. Barnes, and T. Brewer, "A Novel Release Layer System for IC Processing," INTERFACE '89: Proceedings of the Microelectronics Seminar, Nov. 6-7, 1989, pp. 363-380.


Tony D. Flaim, Barbara L. Horter, and Mary G. Moss, "Synthesis of Polyamic Esters by Reaction of Polyamic Acid Salts With Alkyl Halides," Polyimides: Synthesis, Characterization and Application, Proceedings of Third International Conference on Polyimides, Ellenville, New York, November 2-4, 1988, 1989, pp. 279-291.


William J. Latham, Dan W. Hawley, and John J. Gostic, Jr., "High absorptivity organic coatings from transparent precursors," Proceedings of SPIE: Liquid Crystal Chemistry, Physics, and Applications, vol. 1080, 1989, pp. 227-231.


B. Martin, A.N. Odell, and J. E. Lamb III, "Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing VI, vol. 1086, 1989, pp. 543-554.


Mary G. Moss, Ruth M. Cuzmar, and Terry Brewer, "Positive-working polyimide resists based on diazonaphthoquinone photochemistry," Proceedings of SPIE: Advances in Resist Technology and Processing VI, vol. 1086, 1989, pp. 396-405.

1988


Chung-Peng Ho and Mary G. Moss, "Novel High Resolution Imagable Polyimide Siloxane for Electron Beam Lithography," Proceedings of the ACS Division of Polymeric Materials: Science and Engineering, vol. 59, 1988, pp. 1019-1023.


William J. Latham and Dan W. Hawley, "Color Filters from Dyed Polyimides," Solid State Technology, May vol. 31, no. 5, 1988, pp. 223-226.

1987


James E. Lamb III, Donna D. Hawley, and J. Michael Mori, "Spin-On Dry Etch Process for Submicron Lithography," Microelectronic Engineering, December vol. 6, 1987, pp. 85-90.


William J. Latham, Terry L. Brewer, Dan W. Hawley, James E. Lamb III, and Lynn K. Stichnote, "A New Class of Color Filters for Liquid-Crystal Displays," SID 87 Digest, 1987, pp. 379-382.


William J. Latham, Terry L. Brewer, Dan W. Hawley, James E. Lamb III, and Lynn K. Stichnote, "Polyimide Color Filters for Liquid-Crystal Displays," Proceedings of the SID, vol. 28, no. 4, 1987, pp. 385-389.

1986


Chung-Peng Ho, Ruth Cuzmar, Mary G. Moss, Russ Pagel, and Terry Brewer, "Electron-Beam Lithographic Properties of Polyimides," Proceedings of the ACS Division of Polymeric Materials: Science and Engineering, vol. 54, 1986, pp. 741-745.


William J. Latham, "A Black, Patternable Polyimide Coating for Monolithic Optoelectronics Applications," Proceedings of SPIE: Integration and Packaging of Optoelectronic Devices, vol. 703, 1986, pp. 175-179.

1985


Mike Schmidt, "Novel Reverse Osmosis Membranes by Plasma Polymerization," Ultrapure Water, March-April vol. 2, 1985, pp. 28-30.

1983


Richard D. Coyne and Terry Brewer, "Resist processes on highly reflective surfaces using antireflection coatings," INTERFACE '83: Proceedings of the Kodak Microelectronics Seminar, November 14-15, 1983, pp. 40-51.

1981


Terry Brewer, Robert Carlson, and John Arnold, "The Reduction of the Standing-Wave Effect in Positive Photoresists," Journal of Applied Photographic Engineering, December vol. 7, no. 6, 1981, pp. 184-186.