SPIE: Advanced Lithography

February 25 – March 2, 2018

February 25 – March 2, 2018
Booth #: 110
San Jose Convention Center
San Jose, California

Speaker Information: 

Presenter: Zhimin Zhu
Time: Tuesday, February 27th: 10:30AM – 12:10PM
Optical Microlithography
Session 2: Advanced Process Control
Paper #: 10587-5
Title: High-fidelity lithography against stochastic effects

 

Poster: Nicholas L. Brakensiek, Kui Xu, and Daniel Sweat
Time: Tuesday, February 27th: 5:30 – 7:30PM
Advanced Etch Technology for Nanopatterning VII
Poster #: 10589-26
Title: Optimized plasma etching window of block copolymers and neutral brush layers for enhanced directed self-assembly pattern transfer into hardmask layer

 

Presenter: Kui Xu
Time: Wednesday, February 28th: 1:30PM – 3:10PM
Advanced in Patterning Materials and Processes
Paper #: 10586-32
Session 10: DSA: Defectivity and High-chi
Title: Straightforward directed self-assembly process flows enabled by advanced materials

 

Presenter: Mary Ann J. Hockey
Time: Wednesday, February 28: 10:30AM – 12:10PM
Novel Patterning Technologies 2018
Session 7: DSA Materials and Integration
Session 9: Advanced in Patterning Materials and Processes
Paper #: 10584-23
Title: Manufacturing directed self-assembly flows enabled by advanced materials

 

Session Chair: Douglas Guerrero
Time: Tuesday, February 27: 3:40PM – 4:40PM
Advances in Patterning Materials and Processes XXXV
Session 7: Hardmasks and Underlayer

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For more information: Conference Website