February 10, 2016 – San Jose, CA – Brewer Science invites you to join us February 21 – 25 at SPIE Advanced Lithography in San Jose, CA, as we launch our directed self-assembly (DSA) technology, which combines lithography and self-assembly. SPIE is regarded as the premier international event driving the future of lithography research and applications and is the largest gathering of lithography experts in the world.
Brewer Science is launching an informative educational video about DSA, which offers a variety of applications in the industry. DSA will enable semiconductor manufacturers to create smaller features without additional investment in equipment infrastructure.
Join Brewer Science at the following sessions to learn more about technology innovation:
Mary Ann J. Hockey, Senior Program Manager, will present Tunable BCP L0 Achievement (Paper 9777-68) at Conference 9777, Alternative Lithographic Technologies VIII, DSA, during the poster session on Tuesday, February 23, from 6:00 pm to 8:00 pm.
Dr. Douglas Guerrero, Senior Technologist, serves on the Program Committee for Advances in Patterning Materials and Processes XXXIII. He is a Session Chair for the joint session combining Conference 9779, Session 6, and Conference 9782, Session 5, which will be held on Tuesday, February 23, from 1:20 pm to 3:20 pm and will focus on Patterning Materials and Etch.
Brewer Science will be at Booth 300 at SPIE. A team of technical experts will be available to discuss next-generation technology.
About Brewer Science – Celebrating 35 Years
Brewer Science is a global technology company developing and manufacturing innovative materials, processes, and equipment that are critical to manufacturing technology products. Brewer Science is prepared for the next generation. Are you?
For more information, contact:
Corporate Relations Manager
Tel: (US) +1.573.364.0300