“Advanced Formulation for DSA Resists”
Brewer Science and Arkema Present “Advanced Formulation for DSA Resists” at International Conference of Photopolymer Science and Technology
June 21, 2016 – Chiba, Japan– Brewer Science invites you to attend the 33rd International Conference of Photopolymer Science and Technology sponsored by the Society of Photopolymer Science and Technology (SPST), June 22 through June 24, in 2016 in Chiba, Japan. The conference covers a vast range of topics critical to photopolymer science and the advancement of technology and also contributes to the development of photopolymer science and phototechnology. In addition, the society seeks to find ways to improve the quality of life for human beings.
We invite you to attend a presentation in Room 301 at noon on Thursday, June 23, where Celia Nicolet of Arkema will present, “Advanced Formulation for DSA Resists,” a paper co-authored by Arkema and Brewer Science. Co-authors for this paper are: Celia Nicolet, Xavier Chevalier, Julien Beausoleil, Christophe Navarro, and Ian Cayrefourcq of Arkema France, and Kumba Sakavuyi, John Berron, Darron Juradja, Nick Brakensiek of Brewer Science.
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About Brewer Science – Celebrating 35 Years
Brewer Science is a global technology leader in developing and manufacturing innovative materials, processes, and equipment for the fabrication of semiconductors and microelectronic devices. With its headquarters in Rolla, Missouri, Brewer Science supports customers throughout the world with a service and distribution network in North America, Europe, and Asia. Brewer Science was recognized with the 2014 SEMI Award for North America for revolutionizing optical lithography with ARC® anti-reflective coatings. We’re prepared for the next generation. Are you? Find out at http://www.brewerscience.com.
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