March 09, 2016 – Shanghai, China – Brewer Science invites you to attend China Semiconductor Technology International Conference 2016 (CSTIC 2016), where Senior Scientist Zhimin Zhu will share new findings on chemical effects in lithography on Sunday, March 13. CSTIC 2016 is regarded as the largest and most comprehensive semiconductor technology conference in China. All aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, and manufacturing, as well as emerging semiconductor technologies and silicon material applications, will be covered by industry experts at CSTIC 2016. Dr. Zhu has been selected to present Brewer Science’s new findings on the effect of molecular forces in lithography.
Join Brewer Science at the following session:
Dr. Zhimin Zhu, Senior Scientist, will present "Investigation of Chemical Effects in Lithography" at Symposium II: Lithography & Patterning, Session II – Computational Lithography, third floor, Yellow River Hall, Sunday, March 13, at 4:45 pm. For more information about Brewer Science and technology, email firstname.lastname@example.org or visit Brewer Science’s web site, follow us on Twitter at @BrewerScience, like us on Facebook, and subscribe to our blog.
About Brewer Science – Celebrating 35 Years
Brewer Science is a global technology leader in developing and manufacturing innovative materials, processes, and equipment for the fabrication of semiconductors and microelectronic devices. With its headquarters in Rolla, Missouri, Brewer Science supports customers throughout the world with a service and distribution network in North America, Europe, and Asia. Brewer Science was recognized with the 2014 SEMI Award for North America for revolutionizing optical lithography with ARC® anti-reflective coatings. We’re prepared for the next generation. Are you? Find out at http://www.brewerscience.com.
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