International Symposium on DSA

November 11-13, 2018

DSA ImageNovember 11-13, 2018
Sapporo Park Hotel
Sapporo, Japan

 

 

Brewer Science will attend the 4th International Symposium on DSA in Sapporo, Japan. Directed self-assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. The 4th International Symposium on DSA will be organized as a collaborative effort between EIDEC, imec, CEA-Leti, and NIST. See what Brewer Science has to say about DSA and view our product offerings here and read up on our latest blog, “From The Bottom Up: Making More Room With Selective Surface Modification.”

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