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Highly etch-resistant polymer block for use in block copolymers for directed self-assembly
Click Here to Read MoreWet developable hard mask in conjunction with thin photoresist for microphotolithography
Click Here to Read MoreSpin-on protective coatings for wet-etch processing of microelectronic substrate
Click Here to Read MoreSpin-on protective coatings for wet-etch processing of microelectronic substrates
Click Here to Read MoreMethod of creating photolithographic structures with developer-trimmed hardmask
Click Here to Read MoreNon-subliming mid-UV dyes and utra-thin anti-reflective coatings having differential solubility
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