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As the primary global lithography event, the SPIE Advanced Lithography technical program focuses on works in optical lithography, metrology, and EUV. Jakub Kosa will be presenting, High-temperature stable spin-on carbon materials for advanced pattern transfer applications. Yichen Liang will be presenting, Realization of sub-30 pitch EUV Lithography through the application of functional spin-on glass. Learn…
Click Here to Read MoreFebruary 10, 2017 – San Jose, CA – Brewer Science invites you to join us February 26 through March 2 at SPIE Advanced Lithography in San Jose, CA, as we showcase original technology products created and manufactured at Brewer Science. Attendees will have the opportunity to learn more about the Brewer Science suite of lithography…
Click Here to Read MoreMultilayer technology from Brewer Science has allowed the industry to continue to push the limits of advanced lithography well into the future. Our experts explain why it was needed and how it eventually became the industry standard for leading-edge semiconductor manufacturing.
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