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From the Bottom Up: Making More Room with Selective Surface Modification

Richard Feynman, who won the Nobel Prize in Physics in 1965, gave a famous lecture titled “There's Plenty of Room at the Bottom.” Today’s microelectronics process engineer, in the context of conventional top down lithography, would find it difficult to accept this statement without a long list of caveats. Aggressive scaling demands for newer generations…

  Selective Surface Modification, Lithography, DSA Click Here to Read More