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Brewer Science presents Patterning Concepts using Ultrathin Layers at International Conference in Japan

International Microprocesses and Nanotechnology Conference (MNC 2022) Dr. Douglas Guerrero will present, Patterning Concepts Using Ultrathin Layers in Symposium A: Emerging Breakthroughs in Materials, Processes and Equipment for Advanced Lithography (Litho Breakthrough Symposium) at The 35th International Microprocesses and Nanotechnology Conference (MNC 2022) in Tokushima, Japan on November 8th through 11th. Dr. Guerrero's presentation will…

  Advanced Lithography, Lithography Click Here to Read More

SPIE: Advanced Lithography

February 25 – March 2, 2018 Booth #: 110 San Jose Convention Center San Jose, California Speaker Information:  Presenter: Zhimin Zhu Time: Tuesday, February 27th: 10:30AM – 12:10PM Optical Microlithography Session 2: Advanced Process Control Paper #: 10587-5 Title: High-fidelity lithography against stochastic effects   Poster: Nicholas L. Brakensiek, Kui Xu, and Daniel Sweat Time:…

  SPIE, Advanced Lithography, 2018 Click Here to Read More

SPIE: Advanced Lithography

February 28- March 2, 2017 San Jose, California Booth: 110 Molecular force modeling of lithography - Invited Paper Zhimin Zhu, Brewer Science, Inc. (United States) Session 4: 3D Resist Effects and Modeling Tuesday, February 28th 2017 4:10 - 6:00 PM Location: Convention Center 220C Highχ block copolymers for directed self-assembly patterning without the need for…

  SPIE, 2017, Advanced Lithography Click Here to Read More
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