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International Symposium on DSA

November 11-13, 2018 Sapporo Park Hotel Sapporo, Japan     Brewer Science will attend the 4th International Symposium on DSA in Sapporo, Japan. Directed self-assembly (DSA) is rapidly advancing as a potential patterning solution for advanced lithography. The 4th International Symposium on DSA will be organized as a collaborative effort between EIDEC, imec, CEA-Leti, and…

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Brewer Science's New OptiLign™ DSA Product Family Provides a Cost-Effective Alternative for Advanced-Node Wafer Patterning

Rolla, Missouri – Feb. 27, 2018 – Brewer Science, Inc., today from SPIE Advanced Lithography 2018 introduced its OptiLign™ commercial-quality directed self-assembly (DSA) material set developed in collaboration with Arkema. The OptiLign™ system currently includes three materials required for self-assembly: block copolymers, neutral layers and guiding layers. Developed together for optimal performance, these DSA materials…

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