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Brewer Science presents EUV lithography innovation at Fujifilm Advanced Lithography Workshop in Germany

Brewer Science presents EUV lithography innovation at Fujifilm Advanced Lithography Workshop in Germany Brewer Science will be presenting at the Fujifilm Advanced Lithography Workshop in Desden, Germany on 15 September 2022. Dr. Douglas Guerrero will deliver a presentation titled, Roles of Underlayers in Resist and Underlayer Roadmap for EUV Lithography, during Session II of the…

  EUV Click Here to Read More

Brewer Science presents EUV lithography innovation at largest tech conference in Asia

Brewer Science presents EUV lithography innovation at largest tech conference in Asia Roles of underlayers in EUV lithography is the keynote speech at CSTIC 2022   Rolla, Mo. June 20, 2022 - Brewer Science, Inc., a global leader in developing and manufacturing next-generation materials and processes for the microelectronics and optoelectronics industries, will present the…

  CSTIC, EUV lithography, EUV Click Here to Read More

DSA: How far we've come and how much farther is left to go

To the average consumer, the path of new technology looks pretty linear. A cool new concept emerges, scientists figure out how to manufacture it, and pretty soon consumers can find it in a product. But people who work in technology know that’s hardly ever the case. On September 9th, Darron Jurajda, the Brewer Science Semiconductor…

  SEMICON Taiwan, Gartner Hype Scale, Directed Self-Assembly, EUV, Lithography, DSA Click Here to Read More

EUV Lithography Symposium

October 24-26, 2016 Hiroshima, Japan http://euvl2016.org/ Please look for Tanti Ouattara's poster at 2016 International EUVL Symposium.

  2016, EUV Click Here to Read More

Lithography process simplification for reduced cost of ownership

Cost of ownership plays an important role in lithography process materials and methods decisions. Process simplifications brought about by layer-to-layer synergy drive significant cost of ownership advantages for multilayer lithography systems such as the Brewer Science® OptiStack® system. Savings in mask engineering and manufacture are the greatest cost difference. Optical proximity correction (OPC) algorithms need…

  EUV, Multilayer, Lithography Click Here to Read More
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