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SPIE: Advanced Lithography

February 25 – March 2, 2018 Booth #: 110 San Jose Convention Center San Jose, California Speaker Information:  Presenter: Zhimin Zhu Time: Tuesday, February 27th: 10:30AM – 12:10PM Optical Microlithography Session 2: Advanced Process Control Paper #: 10587-5 Title: High-fidelity lithography against stochastic effects   Poster: Nicholas L. Brakensiek, Kui Xu, and Daniel Sweat Time:…

  Advanced Lithography, 2018, SPIE Click Here to Read More

SPIE: Advanced Lithography

February 28- March 2, 2017 San Jose, California Booth: 110 Molecular force modeling of lithography - Invited Paper Zhimin Zhu, Brewer Science, Inc. (United States) Session 4: 3D Resist Effects and Modeling Tuesday, February 28th 2017 4:10 - 6:00 PM Location: Convention Center 220C Highχ block copolymers for directed self-assembly patterning without the need for…

  SPIE, 2017, Advanced Lithography Click Here to Read More