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Solving Semiconductor Manufacturing Challenges through Surface Modification

Just because a material is a good substrate for making semiconductors doesn’t mean it will do everything the engineer wants it to do. In fact, surface modification — the act of modifying the surface of a material in a way that will affect its ultimate functioning — is integral to semiconductor manufacturing. The molecules and…

  semiconductor manufacturing, surface modification Click Here to Read More

News roundup: How scientists and engineers are tackling the hurricane aftermath

More than two months after hurricanes Irma and Harvey battered the Gulf of Mexico and the Caribbean, the U.S. continues to struggle with remediating the destruction. At times like this, the world relies heavily on scientists and engineers for the brainpower and expertise needed to address the huge problems that result. The scientific community is…

  Innovation, other, technology advancement Click Here to Read More

Automotive Innovation: 6 Exciting Tech Advancements Rolling Your Way

Back in the ‘40s and ‘50s, when computers were just room-sized, relay-based calculators, no one probably thought much about integrating computing technology into automobiles. By 1965, computers were smaller multitaskers running simple software programs, yet the closest they came to automobiles was probably an advertisement that showed the PDP-8, the first minicomputer to enjoy commercial…

  brewer science, technology advancement, Vehicle Click Here to Read More

Biometric Sensors: Revolutionizing the Face We Present to the World

The essence of biometrics is using physical characteristics that are unique to each individual to identify one person from billions of others in the world. Early biometrics were somewhat low-tech; for example, fingerprinting originally required nothing more than some ink, a magnifying glass and a human who knew how to “read” the prints. Today’s biometrics…

  Biometric Sensors, Technology Click Here to Read More

Directed Self-Assembly

 Directed self-assembly (DSA) refers to the integration of block copolymer (BCP) materials that undergo phase separation with traditional manufacturing processes. With DSA, nanoscale dimensions are achieved at a drastically reduced cost by novel material designs without additional equipment upgrades. Alternative lithographic approaches to achieve features ≤10 nanometers in size typically involve higher equipment budgets or…

  Lithography Click Here to Read More

Directed Self-Assembly: From the Top-Down to the Bottom-Up

In previous posts, we’ve made references to Moore’s law and how, with uncanny accuracy, it has predicted that the number of transistors in a dense integrated circuit (IC) would double approximately every two years. The semiconductor industry has tirelessly chased Moore's law ever since it was first coined in the 1970s, but as ICs have…

  Directed Self-Assembly, Lithography, DSA, Integrated Circuits Click Here to Read More

3 places where solar energy is having a tremendous impact

For centuries, humans have tried to harness the seemingly endless power of the sun. And now, it seems like we’re making some big strides. Here are just a few amazing places where solar is really shining. Up on the roof Perhaps the roof isn’t an unlikely place for solar panels to live. Maybe it even…

  solar energy Click Here to Read More

Controlling the spin bowl environment to optimize spin coat quality

A variety of factors can affect the coat quality when spin processing. This article will focus on the role that the bowl environment, and in particlar the ability to control the fume exhaust, has on this process. The drying rate of the resin fluid during the spin process is defined by the nature of the…

  spin bowl, other, spincoat, coat uniformity, spin coat, spin process Click Here to Read More

High-k metal gate (HKMG) technology for CMOS devices

High-k metal gate (HKMG) technology has become one of the front-runners for the next generation of CMOS devices. This new technology incorporates a high-k dielectric, which reduces leakage and improves the dielectric constant. To help with fermi-level pinning and to allow the gate to be adjusted to low threshold voltages, a metal gate is used…

  other Click Here to Read More

Thermally curable middle layer for 193-nm trilayer resist process

New lithographic compositions, for use as middle layers in trilayer processes  resist processes can be applied as very thin films with a very thin layer of photoresist being applied to the top of the middle layer. Thus, the underlying bottom anti-reflective coating is still protected even though the overall stack (i.e., anti-reflective coating plus middle…

  depth-of-focus, Lithography, trilayer, trilayer resist process, lithographic, lithographic composition, anti-reflective coating, 193-nm, unilayer processing Click Here to Read More
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